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Conference Presentation PreJuSER-53744
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Strained silicon on relaxed SiGe made by ion implantation and strain transfer

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2004

206th Meeting of the Electrochemical Society
Seminar, Honolulu, HawaiiHonolulu, Hawaii, 3 Oct 20042004-10-03


Note: Record converted from VDB: 12.11.2012
Contributing Institute(s):
  1. Mikrostrukturforschung (IFF-IMF)
Research Program(s):
  1. Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik (I01)
  2. Kondensierte Materie (M02)

Appears in the scientific report 2004
Notes: Nachtrag
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The record appears in these collections:
Document types > Presentations > Conference Presentations
Institute Collections > ER-C > ER-C-1
Institute Collections > PGI > PGI-5
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 Record created 2012-11-13, last modified 2024-06-10
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