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000010045 084__ $$2WoS$$aPhysics, Fluids & Plasmas
000010045 1001_ $$0P:(DE-HGF)0$$aNeumayer, P.$$b0
000010045 245__ $$aThe role of hot electron refluxing in laser-generated K-alpha sources
000010045 260__ $$a[S.l.]$$bAmerican Institute of Physics$$c2010
000010045 300__ $$a103103
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000010045 440_0 $$04939$$aPhysics of Plasmas$$v17$$x1070-664X
000010045 500__ $$aWe would like to thank the PHELIX laser and operations team for their support, as well as the GSI target laboratory for target preparation. This work was supported in part by Laserlab Europe and by the ExtreMe Matter Institute EMMI in the framework of the Helmholtz Alliance HA216/EMMI.
000010045 520__ $$aA study of the contribution of refluxing electrons in the production of K-alpha radiation from high-intensity laser irradiated thin targets has been performed. Thin copper foils both freestanding, and backed by a thick substrate were irradiated with laser pulses of energies around 100 J at intensities ranging from below 10(17) to above 10(19) W/cm(2). At high laser intensities we find a strong reduction in the K-alpha yield from targets backed by the substrate. The observed yield reduction is in good agreement with a simple model using hot electron spectra from particle-in-cell simulations or directly inferred from the measured bremsstrahlung emission and can therefore be interpreted as due to the suppression of hot electron refluxing. The study shows that refluxing electrons play a dominant role in high-intensity laser driven K-alpha generation and have to be taken into account in designing targets for laser driven high-flux K-alpha sources. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3486520]
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000010045 7001_ $$0P:(DE-HGF)0$$aAurand, B.$$b1
000010045 7001_ $$0P:(DE-HGF)0$$aBasko, M.$$b2
000010045 7001_ $$0P:(DE-HGF)0$$aEcker, B.$$b3
000010045 7001_ $$0P:(DE-Juel1)132115$$aGibbon, P.$$b4$$uFZJ
000010045 7001_ $$0P:(DE-HGF)0$$aHochhaus, D.C.$$b5
000010045 7001_ $$0P:(DE-Juel1)132156$$aKarmakar, A.$$b6$$uFZJ
000010045 7001_ $$0P:(DE-HGF)0$$aKazakov, E.$$b7
000010045 7001_ $$0P:(DE-HGF)0$$aKühl, T.$$b8
000010045 7001_ $$0P:(DE-HGF)0$$aLabaune, C.$$b9
000010045 7001_ $$0P:(DE-HGF)0$$aRosmej, O.$$b10
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000010045 7001_ $$0P:(DE-HGF)0$$aZielbauer, B.$$b12
000010045 7001_ $$0P:(DE-HGF)0$$aZimmer, D.$$b13
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