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001006633 1001_ $$00000-0001-5789-8286$$aCho, Deok-Yong$$b0
001006633 245__ $$aChemical Influence of Carbon Interface Layers in Metal/Oxide Resistive Switches
001006633 260__ $$aWashington, DC$$bSoc.$$c2023
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001006633 520__ $$aThin layers introduced between a metal electrode and a solid electrolyte can significantly alter the transport of mass and charge at the interfaces and influence the rate of electrode reactions. C films embedded in functional materials can change the chemical properties of the host, thereby altering the functionality of the whole device. Using X-ray spectroscopies, here we demonstrate that the chemical and electronic structures in a representative redox-based resistive switching (RS) system, Ta2O5/Ta, can be tuned by inserting a graphene or ultrathin amorphous C layer. The results of the orbitalwise analyses of synchrotron Ta L3-edge, C K-edge, and O K-edge X-ray absorption spectroscopy showed that the C layers between Ta2O5 and Ta are significantly oxidized to form COx and, at the same time, oxidize the Ta layers with different degrees of oxidation depending on the distance: full oxidation at the nearest 5 nm Ta and partial oxidation in the next 15 nm Ta. The depth-resolved information on the electronic structure for each layer further revealed a significant modification of the band alignments due to C insertion. Full oxidation of the Ta metal near the C interlayer suggests that the oxygen-vacancy-related valence change memory mechanism for the RS can be suppressed, thereby changing the RS functionalities fundamentally. The knowledge on the origin of C-enhanced surfaces can be applied to other metal/oxide interfaces and used for the advanced design of memristive devices.
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001006633 7001_ $$00000-0001-9233-3096$$aKim, Ki-jeong$$b1
001006633 7001_ $$00000-0002-7570-8404$$aLee, Kug-Seung$$b2
001006633 7001_ $$0P:(DE-Juel1)162283$$aLübben, Michael$$b3
001006633 7001_ $$0P:(DE-HGF)0$$aChen, Shaochuan$$b4
001006633 7001_ $$0P:(DE-Juel1)131014$$aValov, Ilia$$b5$$eCorresponding author
001006633 773__ $$0PERI:(DE-600)2467494-1$$a10.1021/acsami.3c00920$$gp. acsami.3c00920$$n14$$p18528–18536$$tACS applied materials & interfaces$$v15$$x1944-8244$$y2023
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