001     1007332
005     20230929112529.0
024 7 _ |a 10.3390/electronics12092144
|2 doi
024 7 _ |a 2128/34386
|2 Handle
024 7 _ |a WOS:000987253800001
|2 WOS
037 _ _ |a FZJ-2023-02018
041 _ _ |a English
082 _ _ |a 530
100 1 _ |a Faley, Michael I.
|0 P:(DE-Juel1)130633
|b 0
|e Corresponding author
245 _ _ |a TiN-NbN-TiN and Permalloy Nanostructures for Applications in Transmission Electron Microscopy
260 _ _ |a Basel
|c 2023
|b MDPI
336 7 _ |a article
|2 DRIVER
336 7 _ |a Output Types/Journal article
|2 DataCite
336 7 _ |a Journal Article
|b journal
|m journal
|0 PUB:(DE-HGF)16
|s 1683612333_31150
|2 PUB:(DE-HGF)
336 7 _ |a ARTICLE
|2 BibTeX
336 7 _ |a JOURNAL_ARTICLE
|2 ORCID
336 7 _ |a Journal Article
|0 0
|2 EndNote
520 _ _ |a We fabricated superconducting and ferromagnetic nanostructures, which are intended for applications in transmission electron microscopy (TEM), in a commercial sample holder that can be cooled using liquid helium. Nanoscale superconducting quantum-interference devices (nanoSQUIDs) with sub-100 nm nanobridge Josephson junctions (nJJs) were prepared at a distance of ~300 nm from the edges of a 2 mm × 2 mm × 0.05 mm substrate. Thin-film TiN-NbN-TiN heterostructures were used to optimize the superconducting parameters and enhance the oxidation and corrosion resistance of nJJs and nanoSQUIDs. Non-hysteretic I(V) characteristics of nJJs, as well as peak-to-peak quantum oscillations in the V(B) characteristics of the nanoSQUIDs with an amplitude of up to ~20 µV, were obtained at a temperature ~5 K, which is suitable for operation in TEM. Electron-beam lithography, high-selectivity reactive ion etching with pure SF6 gas, and a naturally created undercut in the Si substrate were used to prepare nanoSQUIDs on a SiN membrane within ~500 nm from the edge of the substrate. Permalloy nanodots with diameters down to ~100 nm were prepared on SiN membranes using three nanofabrication methods. High-resolution TEM revealed that permalloy films on a SiN buffer have a polycrystalline structure with an average grain dimension of approximately 5 nm and a lattice constant of ~0.36 nm. The M(H) dependences of the permalloy films were measured and revealed coercive fields of 2 and 10 G at 300 and 5 K, respectively. These technologies are promising for the fabrication of superconducting electronics based on nJJs and ferromagnetic nanostructures for operation in TEM.
536 _ _ |a 5353 - Understanding the Structural and Functional Behavior of Solid State Systems (POF4-535)
|0 G:(DE-HGF)POF4-5353
|c POF4-535
|f POF IV
|x 0
588 _ _ |a Dataset connected to CrossRef, Journals: juser.fz-juelich.de
700 1 _ |a Williams, Joshua
|0 P:(DE-Juel1)198832
|b 1
|u fzj
700 1 _ |a Lu, Penghan
|0 P:(DE-Juel1)167381
|b 2
|u fzj
700 1 _ |a Dunin-Borkowski, Rafal E.
|0 P:(DE-Juel1)144121
|b 3
773 _ _ |a 10.3390/electronics12092144
|g Vol. 12, no. 9, p. 2144 -
|0 PERI:(DE-600)2662127-7
|n 9
|p 2144 -
|t Electronics
|v 12
|y 2023
|x 2079-9292
856 4 _ |u https://juser.fz-juelich.de/record/1007332/files/electronics-12-02144.pdf
|y OpenAccess
909 C O |o oai:juser.fz-juelich.de:1007332
|p openaire
|p open_access
|p OpenAPC
|p driver
|p VDB
|p openCost
|p dnbdelivery
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 0
|6 P:(DE-Juel1)130633
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 1
|6 P:(DE-Juel1)198832
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 2
|6 P:(DE-Juel1)167381
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 3
|6 P:(DE-Juel1)144121
913 1 _ |a DE-HGF
|b Key Technologies
|l Materials Systems Engineering
|1 G:(DE-HGF)POF4-530
|0 G:(DE-HGF)POF4-535
|3 G:(DE-HGF)POF4
|2 G:(DE-HGF)POF4-500
|4 G:(DE-HGF)POF
|v Materials Information Discovery
|9 G:(DE-HGF)POF4-5353
|x 0
914 1 _ |y 2023
915 p c |a APC keys set
|2 APC
|0 PC:(DE-HGF)0000
915 p c |a Local Funding
|2 APC
|0 PC:(DE-HGF)0001
915 p c |a DFG OA Publikationskosten
|2 APC
|0 PC:(DE-HGF)0002
915 p c |a DOAJ Journal
|2 APC
|0 PC:(DE-HGF)0003
915 _ _ |a OpenAccess
|0 StatID:(DE-HGF)0510
|2 StatID
915 _ _ |a Creative Commons Attribution CC BY 4.0
|0 LIC:(DE-HGF)CCBY4
|2 HGFVOC
915 _ _ |a JCR
|0 StatID:(DE-HGF)0100
|2 StatID
|b ELECTRONICS-SWITZ : 2022
|d 2023-08-24
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0200
|2 StatID
|b SCOPUS
|d 2023-08-24
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0300
|2 StatID
|b Medline
|d 2023-08-24
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0501
|2 StatID
|b DOAJ Seal
|d 2023-07-28T15:36:07Z
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0500
|2 StatID
|b DOAJ
|d 2023-07-28T15:36:07Z
915 _ _ |a Peer Review
|0 StatID:(DE-HGF)0030
|2 StatID
|b DOAJ : Anonymous peer review
|d 2023-07-28T15:36:07Z
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0199
|2 StatID
|b Clarivate Analytics Master Journal List
|d 2023-08-24
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0150
|2 StatID
|b Web of Science Core Collection
|d 2023-08-24
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)1160
|2 StatID
|b Current Contents - Engineering, Computing and Technology
|d 2023-08-24
915 _ _ |a IF < 5
|0 StatID:(DE-HGF)9900
|2 StatID
|d 2023-08-24
920 _ _ |l yes
920 1 _ |0 I:(DE-Juel1)ER-C-1-20170209
|k ER-C-1
|l Physik Nanoskaliger Systeme
|x 0
980 1 _ |a FullTexts
980 _ _ |a journal
980 _ _ |a VDB
980 _ _ |a UNRESTRICTED
980 _ _ |a I:(DE-Juel1)ER-C-1-20170209
980 _ _ |a APC


LibraryCollectionCLSMajorCLSMinorLanguageAuthor
Marc 21