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@ARTICLE{Rosenzweig:1008524,
author = {Rosenzweig, D. S. and Schnedler, M. and Dunin-Borkowski, R.
E. and Ebert, Ph. and Eisele, H.},
title = {{M}orphologic and electronic changes induced by thermally
supported hydrogen cleaning of {G}a{A}s(110) facets},
journal = {Journal of vacuum science $\&$ technology / B},
volume = {41},
number = {4},
issn = {2166-2746},
address = {New York, NY},
publisher = {AIP Publishing},
reportid = {FZJ-2023-02364},
pages = {044202},
year = {2023},
abstract = {Hydrogen exposure and annealing at 400 °C leads to a
layer-by-layer etching of the n-doped GaAs(110) cleavage
surface removing islands and forming preferentially step
edge sections with [001] normal vector. In addition, a large
density of negatively charged point defects is formed,
leading to a Fermi level pinning in the lower part of the
bandgap. Their charge transfer level is in line with that of
Ga vacancies only, suggesting that adatoms desorb
preferentially due to hydrogen bonding and subsequent Ga–H
desorption. The results obtained on cleavage surfaces imply
that the morphology of nanowire sidewall facets obtained by
hydrogen cleaning is that of an etched surface, but not of
the initial growth surface. Likewise, the hydrogen-cleaned
etched surface does not reveal the intrinsic electronic
properties of the initially grown nanowires.},
cin = {ER-C-1},
ddc = {530},
cid = {I:(DE-Juel1)ER-C-1-20170209},
pnm = {5351 - Platform for Correlative, In Situ and Operando
Characterization (POF4-535) / DFG project 390247238 - III-V
Halbleiter Nanodrähte: Korrelation von lokaler
elektronischer Struktur, Leitfähigkeit und Ladungsträger
Lebensdauer (390247238)},
pid = {G:(DE-HGF)POF4-5351 / G:(GEPRIS)390247238},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000993980000002},
doi = {10.1116/6.0002733},
url = {https://juser.fz-juelich.de/record/1008524},
}