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001010183 1001_ $$0P:(DE-Juel1)185961$$aFrahm, T.$$b0$$eCorresponding author$$ufzj
001010183 245__ $$aLateral Electrochemical Metallization Cells for Reconfigurable Interconnect Systems
001010183 260__ $$a[New York, NY]$$bIEEE$$c2023
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001010183 520__ $$aLateral electrochemical metallization (ECM) cells are fabricated with a combined spacer/damascene process. The process allows the realization of nanoscale geometrical distances between the two electrodes independent of lithography. Such lateral ECM cells are an essential part in a reconfigurable interconnect system that may yield a strongly increased connectivity in artificial neural networks. The lateral cells show memristive properties comparable to vertical cells with switching voltages in the range of −1.5V to 2.5V. The influence of electrode line edge roughness on SET kinetics of such lateral cells is investigated via kinetic Monte Carlo simulations, finding a minor influence on SET time variability.
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001010183 7001_ $$0P:(DE-HGF)0$$aButtberg, M.$$b1
001010183 7001_ $$0P:(DE-HGF)0$$aGvozdev, G.$$b2
001010183 7001_ $$aMüller, R. A.$$b3
001010183 7001_ $$aChen, S.$$b4
001010183 7001_ $$00000-0002-3889-7701$$aSun, B.$$b5
001010183 7001_ $$0P:(DE-HGF)0$$aRaffauf, L.$$b6
001010183 7001_ $$0P:(DE-Juel1)158062$$aMenzel, S.$$b7
001010183 7001_ $$0P:(DE-Juel1)131014$$aValov, I.$$b8
001010183 7001_ $$00000-0002-6766-8553$$aWouters, D.$$b9
001010183 7001_ $$0P:(DE-Juel1)131022$$aWaser, R.$$b10
001010183 7001_ $$00000-0001-5136-9287$$aKnoch, J.$$b11
001010183 773__ $$0PERI:(DE-600)2696552-5$$a10.1109/JEDS.2023.3297855$$gVol. 11, p. 432 - 437$$p432 - 437$$tIEEE journal of the Electron Devices Society$$v11$$x2168-6734$$y2023
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