%0 Journal Article
%A Tang, Songyao
%A Grundmann, Annika
%A Fiadziushkin, Hleb
%A Wang, Zhaodong
%A Hoffmann-Eifert, Susanne
%A Ghiami, Amir
%A Debald, Arne
%A Heuken, Michael
%A Vescan, Andrei
%A Kalisch, Holger
%T Migration-Enhanced Metal–Organic Chemical Vapor Deposition of Wafer-Scale Fully Coalesced WS 2 and WSe 2 Monolayers
%J Crystal growth & design
%V 23
%N 3
%@ 1528-7483
%C Washington, DC
%I ACS Publ.
%M FZJ-2024-00369
%P 1547 - 1558
%D 2023
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:000925301500001
%R 10.1021/acs.cgd.2c01134
%U https://juser.fz-juelich.de/record/1020893