TY  - JOUR
AU  - Tang, Songyao
AU  - Grundmann, Annika
AU  - Fiadziushkin, Hleb
AU  - Wang, Zhaodong
AU  - Hoffmann-Eifert, Susanne
AU  - Ghiami, Amir
AU  - Debald, Arne
AU  - Heuken, Michael
AU  - Vescan, Andrei
AU  - Kalisch, Holger
TI  - Migration-Enhanced Metal–Organic Chemical Vapor Deposition of Wafer-Scale Fully Coalesced WS 2 and WSe 2 Monolayers
JO  - Crystal growth & design
VL  - 23
IS  - 3
SN  - 1528-7483
CY  - Washington, DC
PB  - ACS Publ.
M1  - FZJ-2024-00369
SP  - 1547 - 1558
PY  - 2023
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000925301500001
DO  - DOI:10.1021/acs.cgd.2c01134
UR  - https://juser.fz-juelich.de/record/1020893
ER  -