Hauptseite > Publikationsdatenbank > Fabrication of Ultrasmall Si Encapsulated in Silicon Dioxide and Silicon Nitride as Alternative to Impurity Doping > print

001     1024649
005     20250203103139.0
024 7 _ |a 10.1002/pssa.202300066
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100 1 _ |a Frentzen, Michael
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245 _ _ |a Fabrication of Ultrasmall Si Encapsulated in Silicon Dioxide and Silicon Nitride as Alternative to Impurity Doping
260 _ _ |a Weinheim
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536 _ _ |a 5353 - Understanding the Structural and Functional Behavior of Solid State Systems (POF4-535)
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700 1 _ |a Michailow, Michail
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700 1 _ |a Ran, Ke
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700 1 _ |a Wilck, Noël
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700 1 _ |a Mayer, Joachim
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700 1 _ |a Smith, Sean C.
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700 1 _ |a König, Dirk
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700 1 _ |a Knoch, Joachim
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773 _ _ |a 10.1002/pssa.202300066
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