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@ARTICLE{Lu:1024751,
      author       = {Lu, Haoyan and Odstrčil, Michal and Pooley, Charles and
                      Biller, Jan and Mebonia, Mikheil and He, Guanze and Praeger,
                      Matthew and Juschkin, Larissa and Frey, Jeremy and
                      Brocklesby, William},
      title        = {{C}haracterisation of engineered defects in extreme
                      ultraviolet mirror substrates using lab-scale extreme
                      ultraviolet reflection ptychography},
      journal      = {Ultramicroscopy},
      volume       = {249},
      issn         = {0304-3991},
      address      = {Amsterdam},
      publisher    = {Elsevier Science},
      reportid     = {FZJ-2024-02417},
      pages        = {113720 -},
      year         = {2023},
      abstract     = {Ptychography is a lensless imaging technique that is
                      aberration-free and capable of imaging both the amplitude
                      and the phase of radiation reflected or transmitted from an
                      object using iterative algorithms. Working with extreme
                      ultraviolet (EUV) light, ptychography can provide better
                      resolution than conventional optical microscopy and deeper
                      penetration than scanning electron microscope. As a compact
                      lab-scale EUV light sources, high harmonic generation meets
                      the high coherence requirement of ptychography and gives
                      more flexibilities in both budget and experimental time
                      compared to synchrotrons. The ability to measure phase makes
                      reflection-mode ptychography a good choice for
                      characterising both the surface topography and the internal
                      structural changes in EUV multilayer mirrors. This paper
                      describes the use of reflection-mode ptychography with a
                      lab-scale high harmonic generation based EUV light source to
                      perform quantitative measurement of the amplitude and phase
                      reflection from EUV multilayer mirrors with engineered
                      substrate defects. Using EUV light at 29.6 nm from a
                      tabletop high harmonic generation light source, a lateral
                      resolution down to and a phase resolution of (equivalent to
                      topographic height variation of 0.27 nm) are achieved. The
                      effect of surface distortion and roughness on EUV
                      reflectivity is compared to topographic properties of the
                      mirror defects measured using both atomic force microscopy
                      and scanning transmission electron microscopy. Modelling of
                      reflection properties from multilayer mirrors is used to
                      predict the potential of a combination of on-resonance,
                      actinic ptychographic imaging at 13.5 nm and atomic force
                      microscopy for characterising the changes in multilayered
                      structures.},
      cin          = {PGI-9 / JARA-FIT},
      ddc          = {570},
      cid          = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$},
      pnm          = {5234 - Emerging NC Architectures (POF4-523)},
      pid          = {G:(DE-HGF)POF4-5234},
      typ          = {PUB:(DE-HGF)16},
      pubmed       = {37004492},
      UT           = {WOS:000973335500001},
      doi          = {10.1016/j.ultramic.2023.113720},
      url          = {https://juser.fz-juelich.de/record/1024751},
}