001     1026302
005     20240709081954.0
037 _ _ |a FZJ-2024-03373
041 _ _ |a English
100 1 _ |a Stern, Christian
|0 P:(DE-Juel1)190289
|b 0
|e Corresponding author
|u fzj
111 2 _ |a 48th International Conference and Expo on Advanced Ceramics and Composites
|g ICACC2024
|c Daytona Beach
|d 2024-01-28 - 2024-02-02
|w USA
245 _ _ |a Reactive spark plasma sintering of ceramics with garnet structure for plasma etching applications
260 _ _ |c 2024
336 7 _ |a Conference Paper
|0 33
|2 EndNote
336 7 _ |a Other
|2 DataCite
336 7 _ |a INPROCEEDINGS
|2 BibTeX
336 7 _ |a conferenceObject
|2 DRIVER
336 7 _ |a LECTURE_SPEECH
|2 ORCID
336 7 _ |a Conference Presentation
|b conf
|m conf
|0 PUB:(DE-HGF)6
|s 1715747528_1189
|2 PUB:(DE-HGF)
|x After Call
520 _ _ |a Yttrium-Aluminum-Garnet (YAG) is an advanced structural ceramic that has desirable properties for halogen plasma etching chambers used in semiconductor processing. The trend towards more aggressive etching environments requires new material systems with enhanced plasma resistance. To tackle this issue, there is an increasing interest in understanding the specific erosion mechanisms of etch-resistant ceramics. In this study, we present a novel approach to manufacture highly dense ceramics with garnet structure by means of reactive spark plasma sintering of the respective oxides. Targeting on improved plasma resistance compared to YAG, Y was completely replaced by lanthanides (Lu, Yb, Er) enabling us to clarify the role of these lanthanides in the YAG-type structure on the plasma-material interaction. For characterization, all samples were exposed to fluorine-based etching plasmas (CF4/O2/Ar) using an inductively coupled plasma (ICP) etch chamber. The resulting topography was characterized by atomic force microscopy (AFM). Under the given conditions, no physical erosion could be detected and the formation of a reaction layer was the dominating phenomenon. The induced chemical gradient has been analyzed by means of SIMS and STEM. Our results reveal the reaction layer is significantly altered if Y is replaced by lanthanides, which provides a route to study mechanisms of the plasma corrosion process.
536 _ _ |a 899 - ohne Topic (POF4-899)
|0 G:(DE-HGF)POF4-899
|c POF4-899
|f POF IV
|x 0
650 2 7 |a Materials Science
|0 V:(DE-MLZ)SciArea-180
|2 V:(DE-HGF)
|x 0
700 1 _ |a Schwab, Christian
|0 P:(DE-Juel1)194161
|b 1
700 1 _ |a Kindelmann, Moritz
|0 P:(DE-Juel1)174079
|b 2
700 1 _ |a Stamminger, Mark
|0 P:(DE-HGF)0
|b 3
700 1 _ |a Park, Inhee
|0 P:(DE-Juel1)194615
|b 4
700 1 _ |a Bram, Martin
|0 P:(DE-Juel1)129591
|b 5
700 1 _ |a Guillon, Olivier
|0 P:(DE-Juel1)161591
|b 6
909 C O |o oai:juser.fz-juelich.de:1026302
|p VDB
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 0
|6 P:(DE-Juel1)190289
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 1
|6 P:(DE-Juel1)194161
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 2
|6 P:(DE-Juel1)174079
910 1 _ |a External Institute
|0 I:(DE-HGF)0
|k Extern
|b 3
|6 P:(DE-HGF)0
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 4
|6 P:(DE-Juel1)194615
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 5
|6 P:(DE-Juel1)129591
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 6
|6 P:(DE-Juel1)161591
913 1 _ |a DE-HGF
|b Programmungebundene Forschung
|l ohne Programm
|1 G:(DE-HGF)POF4-890
|0 G:(DE-HGF)POF4-899
|3 G:(DE-HGF)POF4
|2 G:(DE-HGF)POF4-800
|4 G:(DE-HGF)POF
|v ohne Topic
|x 0
914 1 _ |y 2024
920 _ _ |l yes
920 1 _ |0 I:(DE-Juel1)IEK-1-20101013
|k IEK-1
|l Werkstoffsynthese und Herstellungsverfahren
|x 0
920 1 _ |0 I:(DE-Juel1)ER-C-2-20170209
|k ER-C-2
|l Materialwissenschaft u. Werkstofftechnik
|x 1
920 1 _ |0 I:(DE-Juel1)IEK-9-20110218
|k IEK-9
|l Grundlagen der Elektrochemie
|x 2
920 1 _ |0 I:(DE-82)080011_20140620
|k JARA-ENERGY
|l JARA-ENERGY
|x 3
980 _ _ |a conf
980 _ _ |a VDB
980 _ _ |a I:(DE-Juel1)IEK-1-20101013
980 _ _ |a I:(DE-Juel1)ER-C-2-20170209
980 _ _ |a I:(DE-Juel1)IEK-9-20110218
980 _ _ |a I:(DE-82)080011_20140620
980 _ _ |a UNRESTRICTED
981 _ _ |a I:(DE-Juel1)IET-1-20110218
981 _ _ |a I:(DE-Juel1)IMD-2-20101013


LibraryCollectionCLSMajorCLSMinorLanguageAuthor
Marc 21