TY  - JOUR
AU  - Stern, Christian
AU  - Schwab, Christian
AU  - Kindelmann, Moritz
AU  - Stamminger, Mark
AU  - Weirich, Thomas
AU  - Park, Inhee
AU  - Hausen, Florian
AU  - Finsterbusch, Martin
AU  - Bram, Martin
AU  - Guillon, Olivier
TI  - Correlative characterization of plasma etching resistance of various aluminum garnets
JO  - Journal of the American Ceramic Society
VL  - 107
IS  - 11
SN  - 0002-7820
CY  - Westerville, Ohio
PB  - Soc.
M1  - FZJ-2024-04877
SP  - 7105-7118
PY  - 2024
AB  - Plasma etching is a crucial step in semiconductor manufacturing. High cleanliness and wafer-to-wafer reproducibility in the etching chamber are essential in order to successfully achieve nanometer-sized integrated functions on the wafer. The trend toward the application of more aggressive plasma compositions leads to higher demands on the plasma resistance of the materials used in the etching chamber. Due to its excellent etch resistance, yttrium aluminum garnet Y3Al5O12 (YAG) is starting to replace established materials like SiO2 or Al2O3 in this kind of application. In this study, reactive spark plasma sintering (SPS) was used to manufacture highly dense YAG ceramics from the respective oxides. In addition, yttrium was replaced with heavier lanthanoids (Er, Lu), intending to investigate the role of the A-site cation in the garnet type structure on the plasma erosion behavior. The produced materials were exposed to fluorine-based etching plasmas mimicking the conditions in the semiconductor manufacturing apparatus and the erosion behavior was characterized by atomic force microscopy (AFM), secondary ion mass spectrometry (SIMS), transmission electron microscopy (TEM), and profilometry. The induced chemical gradient in the samples is limited to a few nanometers below the surface, which makes its characterization challenging. For advanced analysis, we developed a correlative characterization method combining SIMS and scanning TEM (STEM)–energy-dispersive spectroscopy (EDS) enabling us to examine the structural and chemical changes in the reaction layer locally resolved. In the case of lanthanoid aluminates, an altered reaction layer and reduced fluorine penetration compared to YAG were found. However, a correlation between the characteristics of the induced chemical gradient and the determined physical erosion rates was not evident.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:001247850500001
DO  - DOI:10.1111/jace.19951
UR  - https://juser.fz-juelich.de/record/1028934
ER  -