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@INPROCEEDINGS{Singh:1031780,
      author       = {Singh, Ankita and de Oliveira Lima, Vitor Alexandre and
                      Bednarski-Meinke, Connie and Kentzinger, Emmanuel},
      title        = {{I}nvestigation on the presence of magnetic skyrmions in
                      {S}r{I}r{O}3/{S}r{R}u{O}3bilayer {I}nterface on
                      {S}r{T}i{O}3},
      reportid     = {FZJ-2024-05807},
      year         = {2024},
      abstract     = {Topological magnetic textures, known as magnetic skyrmions,
                      hold significant promise for applicationsas nanoscale
                      information components in logic and memory devices. These
                      quasiparticles,characterized by their swirling spin
                      configurations, exhibit unique advantages due to their
                      stability,diminutive size, and the low current densities
                      required for manipulation [1]. In transition metal
                      oxides,electronic correlations between 4d and 5d oxides in
                      bilayer forms induce strong spin-orbit coupling(SOC),
                      facilitating the formation of magnetic skyrmions on the
                      surface of SrRuO3 (SRO). Stacksof SrRuO3/SrIrO3 (SIO)
                      epitaxial layers integrate essential elements such as the
                      Dzyaloshinskii-Moriya interaction (DMI), large perpendicular
                      magnetic anisotropy (PMA), and spin-orbit torques(SOT) to
                      stabilize magnetic skyrmions and enable their efficient
                      current-driven motion. Bilayers ofSRO/SIO are grown on TiO2
                      terminated SrTiO3 (STO) (001) substrates, where the growth
                      of SRO isachieved via High Oxygen Pressure Sputtering (HOPS)
                      and SIO via Molecular Beam Epitaxy (MBE).Precise control of
                      film thickness is crucial to maintain the intrinsic
                      properties of both materials andobserve magnetic skyrmions.
                      Therefore, we systematically vary the thickness of both the
                      layers tooptimize their magnetic properties,
                      magnetoresistance and the Hall effect that includes ordinary
                      Halleffect (OHE), anomalous Hall effect (AHE), and
                      Topological Hall effect (THE). Given the
                      challengesassociated with directly observing skyrmions
                      directly at the nano-meter scale in the real space, weemploy
                      the topological Hall effect as an indirect method to
                      characterize magnetic skyrmions in ferromagneticthin
                      films[2]. For detailed interfacial and surface studies of
                      the thin films, PolarizedNeutron Reflectometry (PNR) and
                      Grazing Incidence Small Angle Neutron Scattering (GISANS)
                      willbe performed. The expected results will test the
                      hypothesis of the presence of ordered magneticskyrmions and
                      their contribution to the topological Hall effect in the
                      bilayer oxide thin film, potentiallyadvancing our
                      understanding of skyrmion dynamics and their application in
                      spintronicsdevices.[1] N. Nagaosa et. al. Nat. Nanotechnol.
                      8, 899-911, (2013).[2] Xu Niu et. al. J. Phys.: Condens.
                      Matter 34, 244001, (2022).E-mail of the corresponding
                      author: an.singh@fz-juelich.de},
      month         = {Oct},
      date          = {2024-10-08},
      organization  = {JCNS Workshop 2024, Trends and
                       Perspectives in Neutron Scattering:
                       Functional Interfaces, Evangelische
                       Akademie Tutzing (Germany), 8 Oct 2024
                       - 11 Oct 2024},
      subtyp        = {Invited},
      cin          = {JCNS-2 / JARA-FIT},
      cid          = {I:(DE-Juel1)JCNS-2-20110106 / $I:(DE-82)080009_20140620$},
      pnm          = {632 - Materials – Quantum, Complex and Functional
                      Materials (POF4-632) / 6G4 - Jülich Centre for Neutron
                      Research (JCNS) (FZJ) (POF4-6G4)},
      pid          = {G:(DE-HGF)POF4-632 / G:(DE-HGF)POF4-6G4},
      typ          = {PUB:(DE-HGF)24},
      url          = {https://juser.fz-juelich.de/record/1031780},
}