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@INPROCEEDINGS{Stern:1032003,
      author       = {Stern, Christian and Schwab, Christian and Kindelmann,
                      Moritz and Stamminger, Mark and Park, Inhee and Hausen,
                      Florian and Finsterbusch, Martin and Bram, Martin and
                      Guillon, Olivier},
      title        = {{C}orrelative characterization of plasma etching resistance
                      of various aluminum garnets},
      reportid     = {FZJ-2024-05919},
      year         = {2024},
      abstract     = {Plasma etching is a vital step in semiconductor processing,
                      requiring stringent cleanliness and reproducibility to
                      achieve nanometer-sized transistors. As plasma parameters
                      become more aggressive, YAG (Y3Al5O12) outperforms
                      traditional materials in this application. This study
                      employed reactive spark plasma sintering (SPS) to synthesize
                      highly dense YAG ceramics. Additionally, yttrium was
                      replaced with heavier lanthanoids (Er, Lu) to investigate
                      the role of the A-site cation on the erosion behavior. The
                      materials were exposed to fluorine-based etching plasmas of
                      different corrosiveness. Successive characterization
                      uncovered that less aggressive parameters did not trigger
                      physical erosion, but induced a reaction layer. For in-depth
                      analysis, a correlative method coupling ToF-SIMS and
                      STEM-EDS was developed and characteristics of the chemical
                      gradient were derived. Aggressive plasma parameters led to
                      physical erosion that was characterized by profilometry. The
                      study reveals that the chemical gradient under weak etching
                      conditions cannot be used to predict the etch performance
                      under more aggressive parameters.},
      month         = {Oct},
      date          = {2024-10-06},
      organization  = {The Materials Science $\&$ Technology
                       $(MS\&T)$ technical meeting and
                       exhibition, Pittsburgh (USA), 6 Oct
                       2024 - 9 Oct 2024},
      subtyp        = {Invited},
      cin          = {IMD-2 / ER-C-2 / IET-1 / JARA-ENERGY},
      cid          = {I:(DE-Juel1)IMD-2-20101013 / I:(DE-Juel1)ER-C-2-20170209 /
                      I:(DE-Juel1)IET-1-20110218 / $I:(DE-82)080011_20140620$},
      pnm          = {1221 - Fundamentals and Materials (POF4-122)},
      pid          = {G:(DE-HGF)POF4-1221},
      typ          = {PUB:(DE-HGF)6},
      doi          = {10.34734/FZJ-2024-05919},
      url          = {https://juser.fz-juelich.de/record/1032003},
}