Gast ::
| Hauptseite > Publikationsdatenbank > Correlative characterization of plasma etching resistance of various aluminum garnets > print |
| Hauptseite > Publikationsdatenbank > Correlative characterization of plasma etching resistance of various aluminum garnets > print |
| 001 | 1032003 | ||
| 005 | 20241023211805.0 | ||
| 024 | 7 | _ | |a 10.34734/FZJ-2024-05919 |2 datacite_doi |
| 037 | _ | _ | |a FZJ-2024-05919 |
| 041 | _ | _ | |a English |
| 100 | 1 | _ | |a Stern, Christian |0 P:(DE-Juel1)190289 |b 0 |e Corresponding author |
| 111 | 2 | _ | |a The Materials Science & Technology (MS&T) technical meeting and exhibition |g MS&T24 |c Pittsburgh |d 2024-10-06 - 2024-10-09 |w USA |
| 245 | _ | _ | |a Correlative characterization of plasma etching resistance of various aluminum garnets |
| 260 | _ | _ | |c 2024 |
| 336 | 7 | _ | |a Conference Paper |0 33 |2 EndNote |
| 336 | 7 | _ | |a Other |2 DataCite |
| 336 | 7 | _ | |a INPROCEEDINGS |2 BibTeX |
| 336 | 7 | _ | |a conferenceObject |2 DRIVER |
| 336 | 7 | _ | |a LECTURE_SPEECH |2 ORCID |
| 336 | 7 | _ | |a Conference Presentation |b conf |m conf |0 PUB:(DE-HGF)6 |s 1729662025_23292 |2 PUB:(DE-HGF) |x Invited |
| 520 | _ | _ | |a Plasma etching is a vital step in semiconductor processing, requiring stringent cleanliness and reproducibility to achieve nanometer-sized transistors. As plasma parameters become more aggressive, YAG (Y3Al5O12) outperforms traditional materials in this application. This study employed reactive spark plasma sintering (SPS) to synthesize highly dense YAG ceramics. Additionally, yttrium was replaced with heavier lanthanoids (Er, Lu) to investigate the role of the A-site cation on the erosion behavior. The materials were exposed to fluorine-based etching plasmas of different corrosiveness. Successive characterization uncovered that less aggressive parameters did not trigger physical erosion, but induced a reaction layer. For in-depth analysis, a correlative method coupling ToF-SIMS and STEM-EDS was developed and characteristics of the chemical gradient were derived. Aggressive plasma parameters led to physical erosion that was characterized by profilometry. The study reveals that the chemical gradient under weak etching conditions cannot be used to predict the etch performance under more aggressive parameters. |
| 536 | _ | _ | |a 1221 - Fundamentals and Materials (POF4-122) |0 G:(DE-HGF)POF4-1221 |c POF4-122 |f POF IV |x 0 |
| 650 | 2 | 7 | |a Materials Science |0 V:(DE-MLZ)SciArea-180 |2 V:(DE-HGF) |x 0 |
| 700 | 1 | _ | |a Schwab, Christian |0 P:(DE-Juel1)194161 |b 1 |
| 700 | 1 | _ | |a Kindelmann, Moritz |0 P:(DE-Juel1)174079 |b 2 |
| 700 | 1 | _ | |a Stamminger, Mark |0 P:(DE-HGF)0 |b 3 |
| 700 | 1 | _ | |a Park, Inhee |0 P:(DE-Juel1)194615 |b 4 |
| 700 | 1 | _ | |a Hausen, Florian |0 P:(DE-Juel1)167581 |b 5 |u fzj |
| 700 | 1 | _ | |a Finsterbusch, Martin |0 P:(DE-Juel1)145623 |b 6 |
| 700 | 1 | _ | |a Bram, Martin |0 P:(DE-Juel1)129591 |b 7 |
| 700 | 1 | _ | |a Guillon, Olivier |0 P:(DE-Juel1)161591 |b 8 |
| 856 | 4 | _ | |y OpenAccess |u https://juser.fz-juelich.de/record/1032003/files/Slides.pdf |
| 856 | 4 | _ | |y OpenAccess |x icon |u https://juser.fz-juelich.de/record/1032003/files/Slides.gif?subformat=icon |
| 856 | 4 | _ | |y OpenAccess |x icon-1440 |u https://juser.fz-juelich.de/record/1032003/files/Slides.jpg?subformat=icon-1440 |
| 856 | 4 | _ | |y OpenAccess |x icon-180 |u https://juser.fz-juelich.de/record/1032003/files/Slides.jpg?subformat=icon-180 |
| 856 | 4 | _ | |y OpenAccess |x icon-640 |u https://juser.fz-juelich.de/record/1032003/files/Slides.jpg?subformat=icon-640 |
| 909 | C | O | |o oai:juser.fz-juelich.de:1032003 |p openaire |p open_access |p VDB |p driver |
| 910 | 1 | _ | |a Forschungszentrum Jülich |0 I:(DE-588b)5008462-8 |k FZJ |b 0 |6 P:(DE-Juel1)190289 |
| 910 | 1 | _ | |a Forschungszentrum Jülich |0 I:(DE-588b)5008462-8 |k FZJ |b 1 |6 P:(DE-Juel1)194161 |
| 910 | 1 | _ | |a Forschungszentrum Jülich |0 I:(DE-588b)5008462-8 |k FZJ |b 2 |6 P:(DE-Juel1)174079 |
| 910 | 1 | _ | |a Forschungszentrum Jülich |0 I:(DE-588b)5008462-8 |k FZJ |b 4 |6 P:(DE-Juel1)194615 |
| 910 | 1 | _ | |a Forschungszentrum Jülich |0 I:(DE-588b)5008462-8 |k FZJ |b 5 |6 P:(DE-Juel1)167581 |
| 910 | 1 | _ | |a RWTH Aachen |0 I:(DE-588b)36225-6 |k RWTH |b 5 |6 P:(DE-Juel1)167581 |
| 910 | 1 | _ | |a Forschungszentrum Jülich |0 I:(DE-588b)5008462-8 |k FZJ |b 6 |6 P:(DE-Juel1)145623 |
| 910 | 1 | _ | |a Forschungszentrum Jülich |0 I:(DE-588b)5008462-8 |k FZJ |b 7 |6 P:(DE-Juel1)129591 |
| 910 | 1 | _ | |a Forschungszentrum Jülich |0 I:(DE-588b)5008462-8 |k FZJ |b 8 |6 P:(DE-Juel1)161591 |
| 913 | 1 | _ | |a DE-HGF |b Forschungsbereich Energie |l Materialien und Technologien für die Energiewende (MTET) |1 G:(DE-HGF)POF4-120 |0 G:(DE-HGF)POF4-122 |3 G:(DE-HGF)POF4 |2 G:(DE-HGF)POF4-100 |4 G:(DE-HGF)POF |v Elektrochemische Energiespeicherung |9 G:(DE-HGF)POF4-1221 |x 0 |
| 914 | 1 | _ | |y 2024 |
| 915 | _ | _ | |a OpenAccess |0 StatID:(DE-HGF)0510 |2 StatID |
| 920 | _ | _ | |l yes |
| 920 | 1 | _ | |0 I:(DE-Juel1)IMD-2-20101013 |k IMD-2 |l Werkstoffsynthese und Herstellungsverfahren |x 0 |
| 920 | 1 | _ | |0 I:(DE-Juel1)ER-C-2-20170209 |k ER-C-2 |l Materialwissenschaft u. Werkstofftechnik |x 1 |
| 920 | 1 | _ | |0 I:(DE-Juel1)IET-1-20110218 |k IET-1 |l Grundlagen der Elektrochemie |x 2 |
| 920 | 1 | _ | |0 I:(DE-82)080011_20140620 |k JARA-ENERGY |l JARA-ENERGY |x 3 |
| 980 | _ | _ | |a conf |
| 980 | _ | _ | |a VDB |
| 980 | _ | _ | |a UNRESTRICTED |
| 980 | _ | _ | |a I:(DE-Juel1)IMD-2-20101013 |
| 980 | _ | _ | |a I:(DE-Juel1)ER-C-2-20170209 |
| 980 | _ | _ | |a I:(DE-Juel1)IET-1-20110218 |
| 980 | _ | _ | |a I:(DE-82)080011_20140620 |
| 980 | 1 | _ | |a FullTexts |
| Library | Collection | CLSMajor | CLSMinor | Language | Author |
|---|