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@ARTICLE{Yin:1032607,
author = {Yin, Hao and Hutter, Mark and Wagner, Christian and Tautz,
Frank Stefan and Bocquet, Francois C and Kumpf, Christian},
title = {{E}pitaxial growth of mono- and (twisted) multilayer
graphene on {S}i{C}(0001)},
reportid = {FZJ-2024-06375},
year = {2024},
abstract = {To take full advantage of twisted bilayers of graphene or
other two-dimensional materials, it is essential to
precisely control the twist angle between the stacked
layers, as this parameter determines the properties of the
heterostructure. In this context, a growth routine using
borazine as a surfactant molecule on SiC(0001) surfaces has
been reported, leading to the formation of high-quality
epitaxial graphene layers that are unconventionally
oriented, i.e., aligned with the substrate lattice (G-R0∘)
[Bocquet et al. Phys. Rev. Lett. 125, 106102 (2020)]. Since
the G-R0∘ layer sits on a buffer layer, also known as
zeroth-layer graphene (ZLG), which is rotated 30∘ with
respect to the SiC substrate and still covalently bonded to
it, decoupling the ZLG-R30∘ from the substrate can lead to
high-quality twisted bilayer graphene (tBLG). Here we report
the decoupling of ZLG-R30∘ by increasing the temperature
during annealing in a borazine atmosphere. While this
converts ZLG-R30∘ to G-R30∘ and thus produces tBLG, the
growth process at elevated temperature is no longer
self-limiting, so that the surface is covered by a patchwork
of graphene multilayers of different thicknesses. We find a
$20\%$ coverage of tBLG on ZLG, while on the rest of the
surface tBLG sits on one or more additional graphene layers.
In order to achieve complete coverage with tBLG only,
alternative ways of decoupling the ZLG, e.g., by
intercalation with suitable atoms, may be advantageous.},
cin = {PGI-3},
cid = {I:(DE-Juel1)PGI-3-20110106},
pnm = {5213 - Quantum Nanoscience (POF4-521)},
pid = {G:(DE-HGF)POF4-5213},
typ = {PUB:(DE-HGF)25},
doi = {10.34734/FZJ-2024-06375},
url = {https://juser.fz-juelich.de/record/1032607},
}