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000010333 0247_ $$2DOI$$a10.1016/j.jnucmat.2010.08.019
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000010333 084__ $$2WoS$$aMaterials Science, Multidisciplinary
000010333 084__ $$2WoS$$aNuclear Science & Technology
000010333 084__ $$2WoS$$aMining & Mineral Processing
000010333 1001_ $$0P:(DE-HGF)0$$aUeda, Y.$$b0
000010333 245__ $$aExposure of tungsten nano-structure to TEXTOR edge plasma
000010333 260__ $$aAmsterdam [u.a.]$$bElsevier Science$$c2011
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000010333 440_0 $$03620$$aJournal of Nuclear Materials$$v415$$x0022-3115$$y1
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000010333 520__ $$aW nano-structures (fuzz), produced in the linear high plasma device, NAGDIS, were exposed to TEXTOR edge plasmas (ohmic He/D mixed plasma and pure D plasma) to study formation, erosion and C deposition on W fuzz in tokamak plasmas for the first time. Fuzz layers were either completely eroded or covered by C deposit. There was no clear indication of W fuzz growth under the present conditions. There was no significant difference of C deposition between 'thick' fuzz (500-600 nm in thickness) and 'thin' fuzz (300-400 nm) in the He/D plasma. On the W fuzz surface. C deposition was enhanced probably due to reduction of effective sputtering yield and effective reflection coefficient of carbon ions, similar to roughness effects. Formation and erosion of W fuzz in tokamak devices and role of impurities are discussed. (C) 2010 Elsevier B.V. All rights reserved.
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000010333 7001_ $$0P:(DE-HGF)0$$aMiyata, K.$$b1
000010333 7001_ $$0P:(DE-HGF)0$$aTsukatani, K.$$b2
000010333 7001_ $$0P:(DE-HGF)0$$aOhtsuka, Y.$$b3
000010333 7001_ $$0P:(DE-Juel1)VDB3199$$aBrezinsek, S.$$b4$$uFZJ
000010333 7001_ $$0P:(DE-Juel1)2594$$aCoenen, J. W.$$b5$$uFZJ
000010333 7001_ $$0P:(DE-Juel1)130070$$aKreter, A.$$b6$$uFZJ
000010333 7001_ $$0P:(DE-Juel1)130090$$aLitnovsky, A.$$b7$$uFZJ
000010333 7001_ $$0P:(DE-Juel1)VDB2741$$aPhilipps, V.$$b8$$uFZJ
000010333 7001_ $$0P:(DE-Juel1)130154$$aSchweer, B.$$b9$$uFZJ
000010333 7001_ $$0P:(DE-Juel1)130158$$aSergienko, G.$$b10$$uFZJ
000010333 7001_ $$0P:(DE-HGF)0$$aHirai, T.$$b11
000010333 7001_ $$0P:(DE-HGF)0$$aTaguchi, A.$$b12
000010333 7001_ $$0P:(DE-HGF)0$$aTorikai, Y.$$b13
000010333 7001_ $$0P:(DE-HGF)0$$aSugiyama, K.$$b14
000010333 7001_ $$0P:(DE-HGF)0$$aTanabe, T.$$b15
000010333 7001_ $$0P:(DE-HGF)0$$aKajita, S.$$b16
000010333 7001_ $$0P:(DE-HGF)0$$aOhno, N.$$b17
000010333 773__ $$0PERI:(DE-600)2001279-2$$a10.1016/j.jnucmat.2010.08.019$$gVol. 415, p. S92 - S95$$pS92 - S95$$q415<S92 - S95$$tJournal of nuclear materials$$v415$$x0022-3115$$y2011
000010333 8567_ $$uhttp://dx.doi.org/10.1016/j.jnucmat.2010.08.019
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