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024 7 _ |2 DOI
|a 10.1016/j.jnucmat.2010.08.019
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037 _ _ |a PreJuSER-10333
041 _ _ |a eng
082 _ _ |a 530
084 _ _ |2 WoS
|a Materials Science, Multidisciplinary
084 _ _ |2 WoS
|a Nuclear Science & Technology
084 _ _ |2 WoS
|a Mining & Mineral Processing
100 1 _ |a Ueda, Y.
|b 0
|0 P:(DE-HGF)0
245 _ _ |a Exposure of tungsten nano-structure to TEXTOR edge plasma
260 _ _ |a Amsterdam [u.a.]
|b Elsevier Science
|c 2011
300 _ _ |a S92 - S95
336 7 _ |a Journal Article
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440 _ 0 |a Journal of Nuclear Materials
|x 0022-3115
|0 3620
|y 1
|v 415
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a W nano-structures (fuzz), produced in the linear high plasma device, NAGDIS, were exposed to TEXTOR edge plasmas (ohmic He/D mixed plasma and pure D plasma) to study formation, erosion and C deposition on W fuzz in tokamak plasmas for the first time. Fuzz layers were either completely eroded or covered by C deposit. There was no clear indication of W fuzz growth under the present conditions. There was no significant difference of C deposition between 'thick' fuzz (500-600 nm in thickness) and 'thin' fuzz (300-400 nm) in the He/D plasma. On the W fuzz surface. C deposition was enhanced probably due to reduction of effective sputtering yield and effective reflection coefficient of carbon ions, similar to roughness effects. Formation and erosion of W fuzz in tokamak devices and role of impurities are discussed. (C) 2010 Elsevier B.V. All rights reserved.
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700 1 _ |a Miyata, K.
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700 1 _ |a Tsukatani, K.
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700 1 _ |a Ohtsuka, Y.
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700 1 _ |a Brezinsek, S.
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700 1 _ |a Coenen, J. W.
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700 1 _ |a Kreter, A.
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700 1 _ |a Litnovsky, A.
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700 1 _ |a Philipps, V.
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700 1 _ |a Schweer, B.
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700 1 _ |a Sergienko, G.
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|0 P:(DE-Juel1)130158
700 1 _ |a Hirai, T.
|b 11
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700 1 _ |a Taguchi, A.
|b 12
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700 1 _ |a Torikai, Y.
|b 13
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700 1 _ |a Sugiyama, K.
|b 14
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700 1 _ |a Tanabe, T.
|b 15
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700 1 _ |a Kajita, S.
|b 16
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700 1 _ |a Ohno, N.
|b 17
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773 _ _ |a 10.1016/j.jnucmat.2010.08.019
|g Vol. 415, p. S92 - S95
|p S92 - S95
|q 415|0 PERI:(DE-600)2001279-2
|t Journal of nuclear materials
|v 415
|y 2011
|x 0022-3115
856 7 _ |u http://dx.doi.org/10.1016/j.jnucmat.2010.08.019
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