001040661 001__ 1040661
001040661 005__ 20250317202728.0
001040661 037__ $$aFZJ-2025-01992
001040661 041__ $$aEnglish
001040661 1001_ $$0P:(DE-Juel1)130633$$aFaley, Michael$$b0$$eCorresponding author
001040661 1112_ $$aConference on Superconductivity and Functional Oxides$$cL'Aquila$$d2025-02-19 - 2025-02-21$$gSuperFOx 2025$$wItaly
001040661 245__ $$aSuperconducting nanostructures and 2D superconducting materials for operation in transmission electron microscopes
001040661 260__ $$c2025
001040661 3367_ $$033$$2EndNote$$aConference Paper
001040661 3367_ $$2DataCite$$aOther
001040661 3367_ $$2BibTeX$$aINPROCEEDINGS
001040661 3367_ $$2DRIVER$$aconferenceObject
001040661 3367_ $$2ORCID$$aLECTURE_SPEECH
001040661 3367_ $$0PUB:(DE-HGF)6$$2PUB:(DE-HGF)$$aConference Presentation$$bconf$$mconf$$s1742218659_17529$$xAfter Call
001040661 520__ $$aTransmission electron microscopy enables high-resolution imaging and spectroscopy on active quantum devices. Here, we develop new technologies for operation of low-Tc and high-Tc superconducting nanostructures inside transmission electron microscope (TEM) in order to study their functionality down to atomic level and temperatures down to 5 K. As thin-film materials for the nanobridges, metals Ti and Nb were combined into 3-layer heterostructures for adjusting superconducting parameters of the nanobridge Josephson junctions (nJJs) through the proximity effect. This allowed to reduce spread of parameters (Tc, Ic, etc.) in ultrathin superconducting films and to adjust operating temperature of nJJs to the most stable operating temperature of the commercial TEM sample holders cooled using liquid helium. Cross-sectional TEM images of the Ti-Nb-Ti thin-film heterostructure were obtained and revealed epitaxial growth. Electron beam lithography and high selectivity reactive ion etching with pure SF6 gas were used to pattern nJJs with down to 10 nm width that is comparable to coherence length in thin films of Nb. Nanoscale superconducting quantum interference devices (nanoSQUIDs) with nJJs were prepared on home-made SiN membrane and observed with TEM (Fig. 1a). NanoSQUIDs were also prepared at a distance of below 200 nm from the tip of a cantilever by using a focused ion beam to achieve bulk nanosculpturing of the substrate. Measurements revealed non-hysteretic I(V) characteristics of the nJJs and nanoSQUIDs at operation temperature 5 K. 100-nm-thick NbSe2 flakes were transferred onto SiN membrane with Au contact leads and a hole (Fig. 1b) and measured in TEM down to the temperature below its Tc =7 K. High-Tc nanoSQUIDs were realized with step-edge Josephson junctions. To realize hybrid superconductor-ferromagnetic nanostructures for further experiments in TEM, Permalloy nanodisks and triangles with dimensions down to ~100 nm were prepared on similar SiN membranes and studied by Lorentz microscopy and electron holography methods. These technologies are promising for the fabrication of superconducting electronics for operation inside a TEM.
001040661 536__ $$0G:(DE-HGF)POF4-5351$$a5351 - Platform for Correlative, In Situ and Operando Characterization (POF4-535)$$cPOF4-535$$fPOF IV$$x0
001040661 7001_ $$0P:(DE-Juel1)201540$$aThomsen, Joachim$$b1
001040661 7001_ $$0P:(DE-Juel1)167381$$aLu, Penghan$$b2
001040661 7001_ $$0P:(DE-Juel1)194483$$aVas, Joseph Vimal$$b3$$ufzj
001040661 7001_ $$0P:(DE-Juel1)157886$$aTavabi, Amir Hossein$$b4$$ufzj
001040661 7001_ $$0P:(DE-Juel1)144121$$aDunin-Borkowski, Rafal$$b5
001040661 8564_ $$uhttps://superfox2025.eu/index.php/registration-and-abstracts/book-of-abstract
001040661 909CO $$ooai:juser.fz-juelich.de:1040661$$pVDB
001040661 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)130633$$aForschungszentrum Jülich$$b0$$kFZJ
001040661 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)201540$$aForschungszentrum Jülich$$b1$$kFZJ
001040661 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)167381$$aForschungszentrum Jülich$$b2$$kFZJ
001040661 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)194483$$aForschungszentrum Jülich$$b3$$kFZJ
001040661 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)157886$$aForschungszentrum Jülich$$b4$$kFZJ
001040661 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)144121$$aForschungszentrum Jülich$$b5$$kFZJ
001040661 9131_ $$0G:(DE-HGF)POF4-535$$1G:(DE-HGF)POF4-530$$2G:(DE-HGF)POF4-500$$3G:(DE-HGF)POF4$$4G:(DE-HGF)POF$$9G:(DE-HGF)POF4-5351$$aDE-HGF$$bKey Technologies$$lMaterials Systems Engineering$$vMaterials Information Discovery$$x0
001040661 9141_ $$y2025
001040661 920__ $$lyes
001040661 9201_ $$0I:(DE-Juel1)ER-C-1-20170209$$kER-C-1$$lPhysik Nanoskaliger Systeme$$x0
001040661 980__ $$aconf
001040661 980__ $$aVDB
001040661 980__ $$aI:(DE-Juel1)ER-C-1-20170209
001040661 980__ $$aUNRESTRICTED