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@ARTICLE{Myllymki:10419,
author = {Myllymäki, P. and Roeckerath, M. and Lopes, J. M. J. and
Schubert, J. and Mizohata, K. and Putkonen, M. and
Niinistö, L.},
title = {{R}are earth scandate thin films by atomic layer
deposition: effect of the rare earth cation size},
journal = {Journal of materials chemistry},
volume = {20},
issn = {0959-9428},
address = {London},
publisher = {ChemSoc},
reportid = {PreJuSER-10419},
pages = {4207 - 4212},
year = {2010},
note = {Record converted from VDB: 12.11.2012},
abstract = {A series of amorphous REScO3 films was deposited by atomic
layer deposition (ALD) using rare earth (RE) beta-diketonate
precursors RE(thd)(3) (thd =
2,2,6,6-tetramethyl-3,5-heptanedionato) together with ozone
in an attempt to study the effect of the RE3+ cation size on
various film properties. A clear correlation between the
deposition rate and the RE3+ cation radius was established.
REScO3 films with a metal ratio RE : Sc =1, close to the
stoichiometric one, viz. RE : Sc 1, and a small excess of
oxygen were realized by adjusting the metal precursor
pulsing ratio. Small amount of carbon was found as impurity
in all the films, concentrations varying from 1-3 $at\%$ (RE
= La, Gd or Dy) to 0.4-0.5 $at\%$ (RE = Er or Lu). Also the
crystallization temperature and the resulting phase were
affected by the RE3+ cation size. The REScO3 films were
found to crystallize either as an orthorhombic perovskite
phase or as a solid solution of the cubic C-type oxides.
High crystallization temperatures of 800-900 degrees C were
observed for LaScO3, GdScO3 and DyScO3. All the films gave
smooth C-V curves with very small hysteresis (typically < 35
mV). The highest dielectric constant (kappa approximate to
24) was found for DyScO3. Also the leakage current densities
were small, typically in a range of 10(-6)-10(-9) A cm(-2)
at 1 V. The results confirm that REScO3 films deposited by
ALD are potential candidates for new generation high-kappa
gate dielectrics.},
keywords = {J (WoSType)},
cin = {IBN-1 / JARA-FIT},
ddc = {540},
cid = {I:(DE-Juel1)VDB799 / $I:(DE-82)080009_20140620$},
pnm = {Grundlagen für zukünftige Informationstechnologien},
pid = {G:(DE-Juel1)FUEK412},
shelfmark = {Chemistry, Physical / Materials Science, Multidisciplinary},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000277563800025},
doi = {10.1039/c0jm00363h},
url = {https://juser.fz-juelich.de/record/10419},
}