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@ARTICLE{Xie:1043481,
      author       = {Xie, Qingguang and DU, Tian and Brabec, Christoph and
                      Harting, Jens},
      title        = {{E}ffect of {P}article and {S}ubstrate {W}ettability on
                      {E}vaporation-{D}riven {A}ssembly of {C}olloidal
                      {M}onolayers},
      journal      = {Langmuir},
      volume       = {41},
      number       = {23},
      issn         = {0743-7463},
      address      = {Washington, DC},
      publisher    = {ACS Publ.},
      reportid     = {FZJ-2025-02884},
      pages        = {14995 - 15003},
      year         = {2025},
      abstract     = {Assembled monolayers of colloidal particles are crucial for
                      various applications, including optoelectronics, surface
                      engineering, as well as light harvesting, and catalysis. A
                      common approach for self-assembly is the drying of a
                      colloidal suspension film on a solid substrate using
                      technologies such as printing and coating. However, this
                      approach often presents challenges such as low surface
                      coverage, stacking faults, and the formation of multiple
                      layers. We numerically investigate the influence of
                      substrate and particle wettability on the deposited pattern.
                      Higher substrate wettability results in a monolayer with a
                      hexagonal arrangement of deposited particles on the
                      substrate. Conversely, lower substrate wettability leads to
                      droplet formation after the film ruptures, leading to the
                      formation of particle clusters. Furthermore, we reveal that
                      higher particle wettability can mitigate the impact of
                      substrate wettability and facilitate the formation of highly
                      ordered monolayers. We propose theoretical models predicting
                      the surface coverage fraction dependent on particle volume
                      fraction, initial film thickness, particle radius, as well
                      as substrate and particle wettability, and validate these
                      models with simulations. Our findings provide valuable
                      insights for optimizing the deposition process in the
                      creation of assembled monolayers of colloidal particles.},
      cin          = {IET-2 / IEK-11},
      ddc          = {540},
      cid          = {I:(DE-Juel1)IET-2-20140314 / I:(DE-Juel1)IEK-11-20140314},
      pnm          = {1212 - Materials and Interfaces (POF4-121)},
      pid          = {G:(DE-HGF)POF4-1212},
      typ          = {PUB:(DE-HGF)16},
      pubmed       = {40462733},
      UT           = {WOS:001501813800001},
      doi          = {10.1021/acs.langmuir.5c01195},
      url          = {https://juser.fz-juelich.de/record/1043481},
}