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001     1043492
005     20250626202311.0
024 7 _ |a 10.34734/FZJ-2025-02886
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037 _ _ |a FZJ-2025-02886
041 _ _ |a English
100 1 _ |a Jidar, Rihab
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245 _ _ |a Self-assembly of Silica Nanospheres into Well-Ordered Structures via Annealing
|f - 2025-05-31
260 _ _ |c 2025
300 _ _ |a 41 p.
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336 7 _ |a MASTERSTHESIS
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502 _ _ |a Bachelorarbeit, FH Aachen, 2025
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520 _ _ |a The structural properties of nanoparticles have attracted significant interest due to their potentialapplications in various fields such as catalysis, drug delivery, and optics [1]. Their nanoscaledimensions and large surface area to volume ratio provide unique characteristics, includinghigher reactivity, selectivity, and mechanical strength compared to bulk materials. Among them,silica nanoparticles (SiO₂ NPs) are particularly interesting because of their chemical stability,biocompatibility, and ease of surface functionalization[2].Controlled self-assembly of silica nanoparticles into well-ordered structures is essential foroptimizing their functional performance in advanced applications. Self-assembled monolayers(SAMs) of silica nanoparticles offer a promising route to achieve such organization. The successof this process is strongly influenced by temperature, which affects key factors like solventevaporation rate and particle mobility. Techniques such as spin-coating and drop-casting exploitthese thermally dependent behaviors to achieve desired nanoparticle arrangements. Therefore,understanding and regulating temperature effects is critical for improving the uniformity andquality of self-assembled nanostructures [3].Several studies have explored how thermal treatment (annealing) can be used to improve theorder and stability of nanoparticle assemblies. For example, Jiang et al. (2003) demonstrated thatpost-deposition thermal annealing enhances particle mobility, allowing silica nanospheres torearrange into more ordered hexagonal arrays[4]. Similarly, Zhang et al. (2010) reported thatannealing promotes defect healing in monolayers formed via drop-casting, especially attemperatures near the glass transition of added organic agents [5]. Annealing has also been usedin combination with surface tension gradients or capillary forces to refine large-area colloidalcrystal films with fewer voids and grain boundaries [6]. These studies highlight the importanceof optimizing thermal parameters to promote self-organization and reduce structural defects.However, the key question that this study aims to address is to determine whether shorterannealing durations at elevated temperatures can yield a level of ordering that is comparable towhat was previously achieved in earlier studies—such as the work by Qdemat et al.[7], where awell-ordered silica nanoparticle monolayer was obtained after annealing at 70 °C for 10 days.This comparison is important because it explores whether thermal energy at higher temperaturescan accelerate the ordering process, potentially reducing the required treatment time. Therationale behind this investigation is that nanoparticle self-assembly is influenced by bothtemperature and time, and optimizing this balance could allow for more efficient film formationwithout compromising structural quality.This study investigates the self-assembly behavior of silica nanoparticles approximately 200 nmin diameter on silicon substrates using the drop-casting method, with a particular focus on therole of annealing temperature. By systematically varying the thermal conditions andcharacterizing the resulting structures using Scanning Electron Microscopy (SEM), we aim toevaluate how temperature influences particle organization and contributes to the formation ofhighly ordered monolayers. The findings aim to clarify whether more time-efficient thermaltreatments can still achieve high-quality ordering, which could inform future experimental designand practical applications in nanofabrication.
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