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@INPROCEEDINGS{Schnedler:1044267,
author = {Schnedler, Michael and Lan, Qianqian and Freter, Lars and
Butté, Raphaël and Grandjean, Nicolas and Carlin,
Jean-François and Eisele, Holger and Portz, Verena and Sun,
Qian and Ji, Keyan and Lymperakis, Liverios and Ebert,
Philipp and Dunin-Borkowski, Rafal},
title = {{F}ermi level pinning at nitride semiconductor surfaces and
interfaces},
reportid = {FZJ-2025-03137},
year = {2025},
abstract = {Fermi level pinning plays a crucial role in nitride
semiconductor growth, contact formation, and the engineering
of insulating layers. While pinning effects and carrier
accumulation have been widely studied at nitride surfaces,
their impact on interfaces remains equally significant. In
this presentation, we explore Fermi level pinning at
non-polar (10-10) surfaces and interfaces using scanning
tunneling spectroscopy, off-axis electron holography (EH) in
TEM, and complementary DFT calculations.First we discuss the
interplay of intrinsic surface states, defects, and air
exposure on the Fermi level pinning at non-polar GaN, AlInN,
AlGaN, and InN surfaces as well as the origin of electron
accumulation. The empty group III-derived dangling bond is
found to govern Fermi level pinning on most n-type group III
nitrides, but not for InN, where defects dominate. Likewise
for p-type doping defects govern the Fermi level pinning,
too. Air exposure is found to shift pinning levels toward
the band edges, attributed to water adsorption and
dissociation, passivating intrinsic and extrinsic gap
states. The results demonstrate that for all group III
nitride semiconductors, including InN electron accumulation
is not intrinsic, but rather extrinsically induced by
adlayers. Furthermore, we demonstrate the quantification of
Fermi level pinning by EH in TEM using the example of
focussed ion beam (FIB) implanted carbon. FIB preparation
induces a Fermi level pinning about 0.7 eV above the valence
band edge, attributed to C on N sites. Annealing experiments
allow to probe the defect dynamics and barriers. Notably, it
is demonstrated that carbon undergoes an atomic
site-switching process, transitioning from a substitutional
to an interstitial site where it becomes electrically
inactive upon annealing. These findings provide a profound
foundation for understanding the stability of insulating
layers in ternary nitrides and offer critical insights for
optimizing nitride-based electronic and insulating
structures.},
month = {Jul},
date = {2025-07-06},
organization = {15th International Conference on
Nitride Semiconductors, Malmö
(Sweden), 6 Jul 2025 - 11 Jul 2025},
subtyp = {Invited},
cin = {ER-C-1},
cid = {I:(DE-Juel1)ER-C-1-20170209},
pnm = {5351 - Platform for Correlative, In Situ and Operando
Characterization (POF4-535)},
pid = {G:(DE-HGF)POF4-5351},
typ = {PUB:(DE-HGF)6},
url = {https://juser.fz-juelich.de/record/1044267},
}