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@INPROCEEDINGS{Faley:1047361,
      author       = {Faley, Michael and Arzeo, M. and Denneulin, Thibaud and
                      Kovacs, Andras and Ummethala, Govind and Tavabi, Amir
                      Hossein and Mukhanov, O. and Dunin-Borkowski, Rafal},
      title        = {{M}icrostructural analysis of corrosion inhibition in
                      sub-100nm-scale {J}osephson circuits},
      reportid     = {FZJ-2025-04255},
      year         = {2025},
      abstract     = {We have studied sub-100nm-scale nanobridge Josephson
                      junctions (nJJs) and nJJ-based circuits using
                      microstructural analysis and measurements of electron
                      transport properties to reveal the possible origins of a
                      spread in superconducting parameters (Tc, Ic, etc.) and
                      long-term stability. The structures were prepared by dc
                      magnetron sputtering from Nb, Ti and TiN targets, with
                      electron beam exposure of HSQ resist and reactive ion
                      etching in pure SF6 gas. Microstructural characterization
                      was performed using aberration-corrected scanning
                      transmission electron microscopy imaging and elemental
                      mapping using energy-dispersive X-ray spectroscopy (FEI
                      Titan G2 80-200 ChemiSTEM). The distributions of elements in
                      nanostructures based on Ti-Nb-Ti heterostructures and TiN
                      films were compared. Oxygen-free TiN nJJs, which have been
                      reported previously [1, 2] are of interest for the
                      realization of corrosion-resistant superconducting circuits,
                      including qubits with operating temperatures down to 10 mK.
                      Ti-Nb-Ti heterostructures, including nanoSQUIDs described in
                      a recent paper [3], contain oxygen that has been chemisorbed
                      by the Ti layers and are intended primarily for operation at
                      4.2 K. Superconducting through-silicon vias (TSVs) between
                      circuits on opposite sides of a wafer will also be realized
                      by using direct writing of superconducting current leads
                      with focused-ion-beam-induced deposition and sputter
                      deposition of superconducting films. Particular emphasis
                      will be paid to the inhibition of oxygenation and corrosion
                      on the nanometer scale by using new materials and methods,
                      which promise to bring superconducting chip manufacture
                      closer to circular economy objectives. Our work helps to
                      realize the large-scale integration of long-term-stable
                      superconducting circuits that include nanoSQUIDs, qubits and
                      classical superconducting digital circuits, such as Single
                      Flux Quantum (SFQ) based circuits and the Josephson digital
                      phase detector (JDPD) described in ref. [4].References1. M.
                      I. Faley, Y. Liu and R. E. Dunin-Borkowski, Nanomaterials
                      11, 466 (2021).2. M. I. Faley, H. Fiadziushkin, B. Frohn, P.
                      Schüffelgen and R. E. Dunin-Borkowski, Supercond. Sci.
                      Technol. 35, 065001 (2022).3. M. I. Faley, J. V. Vas, P.-H.
                      Lu and R. E. Dunin-Borkowski, IEEE Transactions on Appl.
                      Supercond. 35, 1600105 (2025).4. L. Di Palma, A. Miano, P.
                      Mastrovito, D. Massarotti, M. Arzeo, G. P. Pepe, F. Tafuri
                      and O. Mukhanov, Phys. Rev. Applied 19, 064025 (2023).},
      month         = {Sep},
      date          = {2025-09-21},
      organization  = {The 17th European Conference on
                       Applied Superconductivity, Porto
                       (Portugal), 21 Sep 2025 - 26 Sep 2025},
      subtyp        = {After Call},
      cin          = {ER-C-1},
      cid          = {I:(DE-Juel1)ER-C-1-20170209},
      pnm          = {5351 - Platform for Correlative, In Situ and Operando
                      Characterization (POF4-535) / ReMade-at-ARI - RECYCLABLE
                      MATERIALS DEVELOPMENT at ANALYTICAL RESEARCH INFRASTRUCTURES
                      (101058414)},
      pid          = {G:(DE-HGF)POF4-5351 / G:(EU-Grant)101058414},
      typ          = {PUB:(DE-HGF)6},
      url          = {https://juser.fz-juelich.de/record/1047361},
}