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@ARTICLE{Park:1047483,
      author       = {Park, Joon Young and Shin, Young Jae and Shin, Jeacheol and
                      Kim, Jehyun and Jo, Janghyun and Yoo, Hyobin and Haei,
                      Danial and Hyun, Chohee and Yun, Jiyoung and Huber, Robert
                      M. and Gupta, Arijit and Watanabe, Kenji and Taniguchi,
                      Takashi and Park, Wan Kyu and Shin, Hyeon Suk and Kim,
                      Miyoung and Kim, Dohun and Yi, Gyu-Chul and Kim, Philip},
      title        = {{D}ouble-sided van der {W}aals epitaxy of topological
                      insulators across an atomically thin membrane},
      journal      = {Nature materials},
      volume       = {24},
      number       = {3},
      issn         = {1476-1122},
      address      = {Basingstoke},
      publisher    = {Nature Publishing Group},
      reportid     = {FZJ-2025-04334},
      pages        = {399 - 405},
      year         = {2025},
      cin          = {ER-C-1},
      ddc          = {610},
      cid          = {I:(DE-Juel1)ER-C-1-20170209},
      pnm          = {5351 - Platform for Correlative, In Situ and Operando
                      Characterization (POF4-535)},
      pid          = {G:(DE-HGF)POF4-5351},
      typ          = {PUB:(DE-HGF)16},
      doi          = {10.1038/s41563-024-02079-5},
      url          = {https://juser.fz-juelich.de/record/1047483},
}