%0 Journal Article
%A Langheinrich, Wolfram
%A Brackmann, Varvara
%A Friedrich, Michael
%A Wislicenus, Marcus
%A Muster, Pascal
%A Pregl, Sebastian
%A Reichmann, Felix
%A Komerički, Nikola
%A Bougeard, Dominique
%A Huckemann, Till
%A Schreiber, Lars
%A Bluhm, Hendrik
%Y Finders, Jo
%Y Stolberg, Ines
%T Fabrication of single-electron shuttling channels in a silicon CMOS fab using high-throughput electron beam lithography
%J Proc. of SPIE
%V 13787
%I SPIE
%M FZJ-2025-05799
%P 137870K
%D 2025
%B 40th European Mask and Lithography Conference (EMLC 2025)
%C 16 Jun 2025 - 18 Jun 2025, Dresden (Germany)
Y2 16 Jun 2025 - 18 Jun 2025
M2 Dresden, Germany
%F PUB:(DE-HGF)8 ; PUB:(DE-HGF)16
%9 Contribution to a conference proceedingsJournal Article
%R doi.org/10.1117/12.3063352
%U https://juser.fz-juelich.de/record/1050091