TY  - JOUR
AU  - Langheinrich, Wolfram
AU  - Brackmann, Varvara
AU  - Friedrich, Michael
AU  - Wislicenus, Marcus
AU  - Muster, Pascal
AU  - Pregl, Sebastian
AU  - Reichmann, Felix
AU  - Komerički, Nikola
AU  - Bougeard, Dominique
AU  - Huckemann, Till
AU  - Schreiber, Lars
AU  - Bluhm, Hendrik
A3  - Finders, Jo
A3  - Stolberg, Ines
TI  - Fabrication of single-electron shuttling channels in a silicon CMOS fab using high-throughput electron beam lithography
JO  - Proc. of SPIE
VL  - 13787
PB  - SPIE
M1  - FZJ-2025-05799
SP  - 137870K
PY  - 2025
T2  - 40th European Mask and Lithography Conference (EMLC 2025)
CY  - 16 Jun 2025 - 18 Jun 2025, Dresden (Germany)
Y2  - 16 Jun 2025 - 18 Jun 2025
M2  - Dresden, Germany
LB  - PUB:(DE-HGF)8 ; PUB:(DE-HGF)16
DO  - DOI:doi.org/10.1117/12.3063352
UR  - https://juser.fz-juelich.de/record/1050091
ER  -