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@ARTICLE{Langheinrich:1050091,
      author       = {Langheinrich, Wolfram and Brackmann, Varvara and Friedrich,
                      Michael and Wislicenus, Marcus and Muster, Pascal and Pregl,
                      Sebastian and Reichmann, Felix and Komerički, Nikola and
                      Bougeard, Dominique and Huckemann, Till and Schreiber, Lars
                      and Bluhm, Hendrik},
      editor       = {Finders, Jo and Stolberg, Ines},
      title        = {{F}abrication of single-electron shuttling channels in a
                      silicon {CMOS} fab using high-throughput electron beam
                      lithography},
      journal      = {Proc. of SPIE},
      volume       = {13787},
      publisher    = {SPIE},
      reportid     = {FZJ-2025-05799},
      pages        = {137870K},
      year         = {2025},
      month         = {Jun},
      date          = {2025-06-16},
      organization  = {40th European Mask and Lithography
                       Conference (EMLC 2025), Dresden
                       (Germany), 16 Jun 2025 - 18 Jun 2025},
      cin          = {PGI-11},
      cid          = {I:(DE-Juel1)PGI-11-20170113},
      pnm          = {5221 - Advanced Solid-State Qubits and Qubit Systems
                      (POF4-522)},
      pid          = {G:(DE-HGF)POF4-5221},
      typ          = {PUB:(DE-HGF)8 / PUB:(DE-HGF)16},
      doi          = {doi.org/10.1117/12.3063352},
      url          = {https://juser.fz-juelich.de/record/1050091},
}