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| Hauptseite > Publikationsdatenbank > Fabrication of single-electron shuttling channels in a silicon CMOS fab using high-throughput electron beam lithography > print |
| Hauptseite > Publikationsdatenbank > Fabrication of single-electron shuttling channels in a silicon CMOS fab using high-throughput electron beam lithography > print |
| 001 | 1050091 | ||
| 005 | 20251223202203.0 | ||
| 024 | 7 | _ | |a 10.1117/12.3063352 |2 doi |
| 024 | 7 | _ | |a doi.org/10.1117/12.3063352 |2 doi |
| 024 | 7 | _ | |a doi.org/10.1117/12.3063352 |2 doi |
| 037 | _ | _ | |a FZJ-2025-05799 |
| 100 | 1 | _ | |a Langheinrich, Wolfram |0 P:(DE-HGF)0 |b 0 |
| 111 | 2 | _ | |a 40th European Mask and Lithography Conference (EMLC 2025) |c Dresden |d 2025-06-16 - 2025-06-18 |w Germany |
| 245 | _ | _ | |a Fabrication of single-electron shuttling channels in a silicon CMOS fab using high-throughput electron beam lithography |
| 260 | _ | _ | |c 2025 |b SPIE |
| 336 | 7 | _ | |a article |2 DRIVER |
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| 700 | 1 | _ | |a Friedrich, Michael |0 P:(DE-HGF)0 |b 2 |
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| 700 | 1 | _ | |a Muster, Pascal |0 P:(DE-HGF)0 |b 4 |
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| 700 | 1 | _ | |a Finders, Jo |0 P:(DE-HGF)0 |b 12 |e Editor |
| 700 | 1 | _ | |a Stolberg, Ines |0 P:(DE-HGF)0 |b 13 |e Editor |
| 773 | _ | _ | |a doi.org/10.1117/12.3063352 |p 137870K |v 13787 |y 2025 |t Proc. of SPIE |
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