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024 7 _ |a 10.34734/FZJ-2026-01484
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037 _ _ |a FZJ-2026-01484
041 _ _ |a English
100 1 _ |a Devaiya, A. J.
|0 P:(DE-Juel1)201941
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111 2 _ |a the 11th NRW Nano Conference
|c Dortmund
|d 2025-09-30 - 2025-10-01
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245 _ _ |a Advanced CSiGeSn heterostructures for photonic applications
260 _ _ |c 2025
336 7 _ |a Conference Paper
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502 _ _ |c University of Cologne
520 _ _ |a Group IV materials provide a foundational platform for advancing silicon-based photonics applications. Especially, GeSn-based Group-IV alloys have demonstrated a direct band gap with higher electron mobility, which is beneficial for photonic integrated chips (PIC) and spintronic fields with complementary metal-oxide semiconductor (CMOS) compatibility.[1] A recent breakthrough in the Si photonics field was the demonstration of continuous-wave, electrically pumped lasing based on advanced SiGeSn/GeSn multi-quantum well structures (MQWs).[2] In addition, theoretical calculations predict that C substitution into the Ge and GeSn lattice further improves the fundamental bandgap directness, enhancing laser performance.[3] Moreover, incorporating C as well as Si and Sn into Ge allowed a large tunability of the light emission in the Mid-infrared range of 2-5 μm. However, the low solid solubility and large lattice mismatch mostly limit the substitutional incorporation of C into the Ge diamond lattice.
536 _ _ |a 5234 - Emerging NC Architectures (POF4-523)
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536 _ _ |a LASTSTEP - group-IV LASer and deTectors on Si-TEchnology Platform (101070208)
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700 1 _ |a Concepción, O.
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700 1 _ |a Liu, Teren
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700 1 _ |a Seidel, L.
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700 1 _ |a Bae, J. H.
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700 1 _ |a Tiedemann, A. T.
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700 1 _ |a Mathur, S.
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700 1 _ |a Oehme, M.
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700 1 _ |a Capellini, G.
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700 1 _ |a Grützmacher, D.
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700 1 _ |a Buca, D.
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856 4 _ |u https://www.nanoconference.de/etn/11th-nrw-nano-conference/
856 4 _ |u https://juser.fz-juelich.de/record/1053152/files/20250731%20NRW_Nano_Conference_Devaiya.pdf
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