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@INPROCEEDINGS{Devaiya:1053173,
author = {Devaiya, Ambrishkumar J. and Concepcion, Omar and Fischer,
Thomas and Tiedemann, Andreas and Capellini, Giovanni and
Mathur, Sanjay and Grützmacher, Detlev and Buca, Dan},
title = {{CS}i{G}e{S}n {E}pitaxy: {F}uture {I}sovalent {I}somorphism
in {G}roup-{IV} {M}aterials},
school = {University of Cologne},
reportid = {FZJ-2026-01505},
year = {2025},
abstract = {Group-IV materials constitute the foundational platform for
advancing silicon-based photonics, spintronic, and energy
technologies.[1] Recent breakthrough in the field includes
the demonstration of continues-wave electrically pumped
lasing based on advanced (Si)GeSn/GeSn MQWs.[2] Theoretical
calculations predicts that the C substitution into Ge
lattice even enhance the directness of band gap leading to
laser performance improvement.[3] In this study, we address
the growth aspects of ternary and quaternary Group-IV
alloys, in comparison with GeSn epitaxy, which serve as
benchmark. Additionally, an unconventional carbon precursor
- CBr4 is introduced and its chemical influence on onset Sn
alloying for CGeSn alloys is presented. Later, the Si induce
defect engineering to compensate the effect of C alloying on
strain relaxation in diamond cubic lattice during (Si)GeSn
epitaxy is studied.},
month = {Nov},
date = {2025-11-17},
organization = {16th International WorkShop on New
Group IV Semiconductor Nanoelectronics,
Sendai (Japan), 17 Nov 2025 - 18 Nov
2025},
subtyp = {Other},
cin = {PGI-9},
cid = {I:(DE-Juel1)PGI-9-20110106},
pnm = {5234 - Emerging NC Architectures (POF4-523) / LASTSTEP -
group-IV LASer and deTectors on Si-TEchnology Platform
(101070208)},
pid = {G:(DE-HGF)POF4-5234 / G:(EU-Grant)101070208},
typ = {PUB:(DE-HGF)6},
doi = {10.34734/FZJ-2026-01505},
url = {https://juser.fz-juelich.de/record/1053173},
}