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000111873 0247_ $$2DOI$$a10.1063/1.4754112
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000111873 084__ $$2WoS$$aPhysics, Applied
000111873 1001_ $$0P:(DE-Juel1)VDB95416$$aWicklein, S.$$b0$$uFZJ
000111873 245__ $$aPulsed laser ablation of complex oxides: The role of congruent ablation and preferential scattering for the film stoichiometry
000111873 260__ $$aMelville, NY$$bAmerican Institute of Physics$$c2012
000111873 300__ $$a131601
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000111873 440_0 $$0562$$aApplied Physics Letters$$v101$$x0003-6951$$y13
000111873 500__ $$3POF3_Assignment on 2016-02-29
000111873 500__ $$aThe research has received funding from European Union Seventh Framework Programme (FP7/2007-2013) under Grant Agreement No. 264098-MAMA and the Deutsche Forschungsgemeinschaft (SFB 917). We thank C. Aruta and E. Di Gennaro for their valuable help.
000111873 520__ $$aBy combining structural and chemical thin film analysis with detailed plume diagnostics and modeling of the laser plume dynamics, we are able to elucidate the different physical mechanisms determining the stoichiometry of the complex oxides model material SrTiO3 during pulsed laser deposition. Deviations between thin film and target stoichiometry are basically a result of two effects, namely, incongruent ablation and preferential scattering of lighter ablated species during their motion towards the substrate in the O-2 background gas. On the one hand, a progressive preferential ablation of the Ti species with increasing laser fluence leads to a regime of Ti-rich thin film growth at larger fluences. On the other hand, in the low laser fluence regime, a more effective scattering of the lighter Ti plume species results in Sr rich films. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4754112]
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000111873 536__ $$0G:(EU-Grant)264098$$aMAMA - Unlocking research potential for multifunctional advanced materials and nanoscale phenomena (264098)$$c264098$$fFP7-REGPOT-2010-1$$x1
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000111873 7001_ $$0P:(DE-HGF)0$$aSambri, A.$$b1
000111873 7001_ $$0P:(DE-Juel1)VDB109739$$aAmoruso, S.$$b2$$uFZJ
000111873 7001_ $$0P:(DE-HGF)0$$aWang, X.$$b3
000111873 7001_ $$0P:(DE-HGF)0$$aBruzzese, R.$$b4
000111873 7001_ $$0P:(DE-Juel1)142225$$aKoehl, A.$$b5$$uFZJ
000111873 7001_ $$0P:(DE-Juel1)VDB5464$$aDittmann, R.$$b6$$uFZJ
000111873 773__ $$0PERI:(DE-600)1469436-0$$a10.1063/1.4754112$$gVol. 101, p. 131601$$p131601$$q101<131601$$tApplied physics letters$$v101$$x0003-6951$$y2012
000111873 8567_ $$uhttp://dx.doi.org/10.1063/1.4754112
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