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@INPROCEEDINGS{HoffmannEifert:111893,
      author       = {Hoffmann-Eifert, S.},
      title        = {{ALD} oxide thin films for resistive memory applications},
      reportid     = {PreJuSER-111893},
      year         = {2012},
      note         = {Record converted from VDB: 16.11.2012},
      comment      = {2nd Enhance MC-INT Winter School},
      booktitle     = {2nd Enhance MC-INT Winter School},
      month         = {Jan},
      date          = {2012-01-09},
      organization  = {Helsinki, Finland, 9 Jan 2012},
      subtyp        = {Invited},
      cin          = {PGI-7 / JARA-FIT},
      cid          = {I:(DE-Juel1)PGI-7-20110106 / $I:(DE-82)080009_20140620$},
      pnm          = {Grundlagen für zukünftige Informationstechnologien},
      pid          = {G:(DE-Juel1)FUEK412},
      typ          = {PUB:(DE-HGF)6},
      url          = {https://juser.fz-juelich.de/record/111893},
}