TY  - CONF
AU  - Hoffmann-Eifert, S.
AU  - Reiners, M.
AU  - Aslam, N.
AU  - Kärkkänen, I.
AU  - Kim, J.H.
AU  - Waser, R.
TI  - Atomic layer deposition of transition metal oxide thin fiilms for resistive memory applications
M1  - PreJuSER-111894
PY  - 2012
N1  - Record converted from VDB: 16.11.2012
Y2  - 17 Jun 2012
M2  - Aachen, 
LB  - PUB:(DE-HGF)6
UR  - https://juser.fz-juelich.de/record/111894
ER  -