Hauptseite > Publikationsdatenbank > ALD process control for tailoring the nanostructure of TiO2 films for resistive switching applications > EndNote Text |
%0 Conference Paper %A Reiners, M. %A Aslam, N. %A Lentz, F. %A Hoffmann-Eifert, S. %A Waser, R. %T ALD process control for tailoring the nanostructure of TiO2 films for resistive switching applications %M PreJuSER-111895 %D 2012 %Z Record converted from VDB: 16.11.2012 %< Nature Conference on Frontiers in Electronic Materials: Correlation Effects and Memristive Phenomena Y2 17 Jun 2012 M2 Aachen, %F PUB:(DE-HGF)6 %9 Conference Presentation %U https://juser.fz-juelich.de/record/111895