%0 Conference Paper
%A Reiner, M.
%A Aslam, N.
%A Hoffmann-Eifert, S.
%A Waser, R.
%T Atomic layer deposition of TiO2 by TDMAT and H2O for resistive switching applications
%M PreJuSER-111900
%D 2012
%Z Record converted from VDB: 16.11.2012
%< Novel High-k Application Workshop
Y2 24 Jan 2012
M2 Dresden, 
%F PUB:(DE-HGF)6
%9 Conference Presentation
%U https://juser.fz-juelich.de/record/111900