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Nanowire and Planar UTB SOI Schottky Barrier MOSFETs with Dopant Segregation

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2012

Proceedings of the 3th International Conference on Ultimate Integration on Silicon (ULIS). - 2012. - S. 67 - 70


Note: Record converted from VDB: 16.11.2012
Contributing Institute(s):
  1. Halbleiter-Nanoelektronik (PGI-9)
  2. Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
Research Program(s):
  1. Grundlagen für zukünftige Informationstechnologien (P42)

Appears in the scientific report 2012
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The record appears in these collections:
Document types > Presentations > Conference Presentations
JARA > JARA > JARA-JARA\-FIT
Institute Collections > PGI > PGI-9
Document types > Books > Books
Workflow collections > Public records
Publications database
 Record created 2012-11-16, last modified 2018-02-11
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