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Talk (non conference) PreJuSER-112050
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Hole mobility enhancement of quantum-well p-MOSFETs on sSi/sSi0.5Ge0.5/sSOI heterostructure

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2012

12th international Workshop on Junction Technology (IWJT-2012)
Seminar, Shanghai, ChinaShanghai, China, 14 May 20122012-05-14


Note: Record converted from VDB: 16.11.2012
Contributing Institute(s):
  1. Halbleiter-Nanoelektronik (PGI-9)
  2. Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
Research Program(s):
  1. Grundlagen für zukünftige Informationstechnologien (P42)

Appears in the scientific report 2012
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The record appears in these collections:
Document types > Presentations > Talks (non-conference)
JARA > JARA > JARA-JARA\-FIT
Institute Collections > PGI > PGI-9
Workflow collections > Public records
Publications database
 Record created 2012-11-16, last modified 2018-02-11
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