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@INPROCEEDINGS{Habicht:11565,
author = {Habicht, S. and Knoll, L. and Zhao, Q. T. and Feste, S. F.
and Mantl, S.},
title = {{C}ontact resistivity and nickel silicidation of strained
and unstrained silicon nanowires},
reportid = {PreJuSER-11565},
year = {2010},
note = {Record converted from VDB: 12.11.2012},
comment = {6th Workshop of the Thematic Network on
Silicon-on-Insulator Technolog (EUROSOI)},
booktitle = {6th Workshop of the Thematic Network
on Silicon-on-Insulator Technolog
(EUROSOI)},
month = {Jan},
date = {2010-01-25},
organization = {Grenoble, France, 25 Jan 2010},
cin = {IBN-1 / JARA-FIT},
cid = {I:(DE-Juel1)VDB799 / $I:(DE-82)080009_20140620$},
pnm = {Grundlagen für zukünftige Informationstechnologien},
pid = {G:(DE-Juel1)FUEK412},
typ = {PUB:(DE-HGF)24},
url = {https://juser.fz-juelich.de/record/11565},
}