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@ARTICLE{Hospach:12533,
      author       = {Hospach, A. and Mauer, G. and Vaßen, R. and Stöver, D.},
      title        = {{C}olumnar-{S}tructured {T}hermal {B}arrier {C}oatings
                      ({TBC}s) by {T}hin {F}ilm {L}ow {P}ressure {P}lasma
                      {S}praying ({LPPS}-{TF})},
      journal      = {Journal of thermal spray technology},
      volume       = {20},
      issn         = {1059-9630},
      address      = {Boston, Mass.},
      publisher    = {Springer},
      reportid     = {PreJuSER-12533},
      pages        = {116 - 120},
      year         = {2011},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {The very low-pressure plasma Spray (VLPPS) process has been
                      developed with the aim of depositing uniform and thin
                      coatings with coverage of a large area by plasma spraying.
                      At typical pressures of 100-200 Pa, the characteristics of
                      the plasma jet change compared to conventional low-pressure
                      plasma-spraying processes (LPPS) operating at 5-20 kPa. The
                      combination of plasma spraying at low pressures with
                      enhanced electrical input power has led to the development
                      of the LPPS-TF process (TF = thin film). At appropriate
                      parameters, it is possible to evaporate the powder feedstock
                      material providing advanced microstructures of the deposits.
                      This technique offers new possibilities for the
                      manufacturing of thermal barrier coatings (TBCs). Besides
                      the material composition, the microstructure is an important
                      key to reduce thermal conductivity and to increase strain
                      tolerance. In this regard, columnar microstructures
                      deposited from the vapor phase show considerable advantages.
                      Therefore, physical vapor deposition by electron beam
                      evaporation (EB-PVD) is applied to achieve such
                      columnar-structured TBCs. However, the deposition rate is
                      low, and the line-of-sight nature of the process involves
                      specific restrictions. In this article, the deposition of
                      TBCs by the LPPS-TF process is shown. How the evaporation of
                      the feedstock powder could be improved and to what extent
                      the deposition rates could be increased were investigated.},
      keywords     = {J (WoSType)},
      cin          = {IEK-1},
      ddc          = {670},
      cid          = {I:(DE-Juel1)IEK-1-20101013},
      pnm          = {Rationelle Energieumwandlung},
      pid          = {G:(DE-Juel1)FUEK402},
      shelfmark    = {Materials Science, Coatings $\&$ Films},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000285421000015},
      doi          = {10.1007/s11666-010-9549-1},
      url          = {https://juser.fz-juelich.de/record/12533},
}