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@INPROCEEDINGS{Uhlenbruck:12535,
      author       = {Uhlenbruck, S. and Fonseca, F.C. and Nédélec, R. and
                      Sebold, D. and Buchkremer, H. P.},
      title        = {{P}hysical vapor deposition of diffusion barrier layers for
                      {S}olid {O}xide {F}uel {C}ells},
      reportid     = {PreJuSER-12535},
      year         = {2010},
      note         = {Record converted from VDB: 12.11.2012},
      comment      = {Materia Symposium},
      booktitle     = {Materia Symposium},
      month         = {Oct},
      date          = {2010-10-20},
      organization  = {Rio de Janeiro, Brasilien, 20 Oct
                       2010},
      cin          = {IEK-1},
      cid          = {I:(DE-Juel1)IEK-1-20101013},
      pnm          = {Rationelle Energieumwandlung / SOFC - Solid Oxide Fuel Cell
                      (SOFC-20140602)},
      pid          = {G:(DE-Juel1)FUEK402 / G:(DE-Juel1)SOFC-20140602},
      typ          = {PUB:(DE-HGF)6},
      url          = {https://juser.fz-juelich.de/record/12535},
}