TY  - JOUR
AU  - Xu,Q.
AU  - Wu,M.Y.
AU  - Schneider,G.F.
AU  - Houben, Lothar
AU  - Malladi,S.K.
AU  - Dekker,C.
AU  - Yucelen,E.
AU  - Dunin-Borkowski, Rafal
TI  - Controllable Atomc Scale Patterning of Freestanding Monolayer Graphene at Elevated Temperature
JO  - ACS nano
VL  - 7 
IS  - 2
SN  - 1936-0851
CY  - Washington, DC
PB  - Soc.
M1  - FZJ-2013-01621
SP  - 1566-1572
PY  - 2013
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000315618700077
C6  - pmid:23343745
DO  - DOI:10.1021/nn3053582
UR  - https://juser.fz-juelich.de/record/133060
ER  -