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@ARTICLE{Stefanov:133436,
author = {Stefanov, S. and Conde, J. C. and Benedetti, A. and Serra,
C. and Werner, J. and Oehme, M. and Schulze, J. and Buca,
Dan Mihai and Holländer, Bernhard and Mantl, Siegfried and
Chiussi, S.},
title = {{S}ilicon germanium tin alloys formed by pulsed laser
induced epitaxy},
journal = {Applied physics letters},
volume = {100},
number = {20},
issn = {0003-6951},
address = {Melville, NY},
publisher = {American Institute of Physics},
reportid = {FZJ-2013-01884},
pages = {204102 -},
year = {2012},
abstract = {Pulsed lased induced epitaxy is used to obtain
heteroepitaxial Ge1−xSnx and Si1−x−yGexSny alloys with
graded composition on Si(001) substrates. The transition
from Ge1−xSnx to Si1−x−yGexSny was achieved by varying
the number of laser pulses accordingly with the level of
intermixing between Si, Ge, and Sn. Melt duration, predicted
by numerical methods, is experimentally confirmed by
"in-situ" reflectivity measurements and relates, like the
end reflectivity value, to the level of intermixing. The
possibility to adjust concentration profiles through laser
processing of Sn films on virtual germanium buffer layers
for lattice engineering of Ge1−xSnx and Si1−x−yGexSny
alloys on silicon substrates is demonstrated.},
cin = {PGI-9 / JARA-FIT},
ddc = {530},
cid = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$},
pnm = {421 - Frontiers of charge based Electronics (POF2-421)},
pid = {G:(DE-HGF)POF2-421},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000304265000107},
doi = {10.1063/1.4714768},
url = {https://juser.fz-juelich.de/record/133436},
}