%0 Journal Article
%A Michard, Stephan
%A Meier, Matthias
%A Grootoonk, B.
%A Astakhov, O.
%A Gordijn, A.
%A Finger, F.
%T High deposition rate processes for the fabrication of microcrystalline silicon thin films
%J Materials science and engineering / B
%V 178
%N 9
%@ 0921-5107
%C New York, NY [u.a.]
%I Elsevier
%M FZJ-2013-03128
%P 691 - 694
%D 2013
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:000318581800026
%R 10.1016/j.mseb.2012.11.020
%U https://juser.fz-juelich.de/record/135161