TY  - JOUR
AU  - Michard, Stephan
AU  - Meier, Matthias
AU  - Grootoonk, B.
AU  - Astakhov, O.
AU  - Gordijn, A.
AU  - Finger, F.
TI  - High deposition rate processes for the fabrication of microcrystalline silicon thin films
JO  - Materials science and engineering / B
VL  - 178
IS  - 9
SN  - 0921-5107
CY  - New York, NY [u.a.]
PB  - Elsevier
M1  - FZJ-2013-03128
SP  - 691 - 694
PY  - 2013
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000318581800026
DO  - DOI:10.1016/j.mseb.2012.11.020
UR  - https://juser.fz-juelich.de/record/135161
ER  -