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@ARTICLE{Michard:135161,
      author       = {Michard, Stephan and Meier, Matthias and Grootoonk, B. and
                      Astakhov, O. and Gordijn, A. and Finger, F.},
      title        = {{H}igh deposition rate processes for the fabrication of
                      microcrystalline silicon thin films},
      journal      = {Materials science and engineering / B},
      volume       = {178},
      number       = {9},
      issn         = {0921-5107},
      address      = {New York, NY [u.a.]},
      publisher    = {Elsevier},
      reportid     = {FZJ-2013-03128},
      pages        = {691 - 694},
      year         = {2013},
      cin          = {IEK-5},
      ddc          = {600},
      cid          = {I:(DE-Juel1)IEK-5-20101013},
      pnm          = {111 - Thin Film Photovoltaics (POF2-111) / FAST TRACK -
                      Accelerated development and prototyping of
                      nano-technology-based high-efficiency thin-film silicon
                      solar modules (283501) / HITEC - Helmholtz Interdisciplinary
                      Doctoral Training in Energy and Climate Research (HITEC)
                      (HITEC-20170406)},
      pid          = {G:(DE-HGF)POF2-111 / G:(EU-Grant)283501 /
                      G:(DE-Juel1)HITEC-20170406},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000318581800026},
      doi          = {10.1016/j.mseb.2012.11.020},
      url          = {https://juser.fz-juelich.de/record/135161},
}