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@ARTICLE{Meier:135162,
      author       = {Meier, Matthias and Paetzold, Ulrich W. and Prömpers,
                      Michael and Merdzhanova, Tsvetelina and Carius, Reinhard and
                      Gordijn, Aad},
      title        = {{UV} nanoimprint for the replication of etched {Z}n{O}:{A}l
                      textures applied in thin-film silicon solar cells},
      journal      = {Progress in photovoltaics},
      volume       = {22},
      number       = {12},
      issn         = {1062-7995},
      address      = {Chichester},
      publisher    = {Wiley},
      reportid     = {FZJ-2013-03129},
      pages        = {1226–1236},
      year         = {2014},
      abstract     = {In this work, we present a technology for a high precision
                      nanostructure replication process based on ultraviolet
                      nanoimprint lithography for the application in the field of
                      thin-film photovoltaics. The potential of the technology is
                      demonstrated by the fabrication of microcrystalline silicon
                      thin-film prototype solar cells. The high accuracy
                      replication of random microstructures made from sputtered
                      and etched ZnO:Al, used to scatter the incident light in
                      thin solar cells, is shown by local topography
                      investigations of the same 7.5 × 7.5 µm2 area on the
                      master and the replica. Different types of imprint resists
                      and imprint moulds were investigated to find the optimal,
                      high precision replication technology. Two types of
                      thin-film silicon solar cells, in p-i-n and n-i-p
                      configuration, were fabricated to study the potential of the
                      imprint technology for different applications. It is shown
                      that solar cells deposited on an imprinted glass hold
                      similar performances compared with reference solar cells
                      fabricated with a standard process on textured ZnO:Al. Thus,
                      it is demonstrated that the replication of light scattering
                      structures by using an imprint process is an attractive
                      method to decouple the scattering properties from the layer
                      forming the electrical front contact. Because a simple and
                      cheap high throughput process is used, this study
                      additionally proves the relevance for the industrial mass
                      production in the field of photovoltaics},
      cin          = {IEK-5 / ICS-8 / PGI-8 / JARA-FIT},
      ddc          = {690},
      cid          = {I:(DE-Juel1)IEK-5-20101013 / I:(DE-Juel1)ICS-8-20110106 /
                      I:(DE-Juel1)PGI-8-20110106 / $I:(DE-82)080009_20140620$},
      pnm          = {111 - Thin Film Photovoltaics (POF2-111) / 453 - Physics of
                      the Cell (POF2-453) / 423 - Sensorics and bioinspired
                      systems (POF2-423) / FAST TRACK - Accelerated development
                      and prototyping of nano-technology-based high-efficiency
                      thin-film silicon solar modules (283501)},
      pid          = {G:(DE-HGF)POF2-111 / G:(DE-HGF)POF2-453 /
                      G:(DE-HGF)POF2-423 / G:(EU-Grant)283501},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000345575500004},
      doi          = {10.1002/pip.2382},
      url          = {https://juser.fz-juelich.de/record/135162},
}