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@ARTICLE{Cho:135190,
      author       = {Cho, Deok-Yong and Tappertzhofen, Stefan and Waser, R. and
                      Valov, Ilia},
      title        = {{C}hemically-inactive interfaces in thin film {A}g/{A}g{I}
                      systems for resistive switching memories},
      journal      = {Scientific reports},
      volume       = {3},
      issn         = {2045-2322},
      address      = {London},
      publisher    = {Nature Publishing Group},
      reportid     = {FZJ-2013-03155},
      pages        = {1169},
      year         = {2013},
      abstract     = {AgI nanoionics-based resistive switching memories were
                      studied in respect to chemical stability of the Ag/AgI
                      interface using x-ray absorption spectroscopy. The apparent
                      dissolution of Ag films of thickness below some tens of
                      nanometers and the loss of electrode/electrolyte contact was
                      critically addressed. The results evidently show that there
                      are no chemical interactions at the interface despite the
                      high ionic mobility of Ag ions. Simulation results further
                      show that Ag metal clusters can form in the AgI layer with
                      intermediate-range order at least up to next-next nearest
                      neighbors, suggesting that Ag can permeate into the AgI only
                      in an aggregated form of metal crystallite.},
      cin          = {PGI-7 / JARA-FIT},
      ddc          = {000},
      cid          = {I:(DE-Juel1)PGI-7-20110106 / $I:(DE-82)080009_20140620$},
      pnm          = {421 - Frontiers of charge based Electronics (POF2-421)},
      pid          = {G:(DE-HGF)POF2-421},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000314394800005},
      doi          = {10.1038/srep01169},
      url          = {https://juser.fz-juelich.de/record/135190},
}