Forschungszentrum Jülich
Institut für Festkörperforschung

Coexistence of strong antiferromagnetic coupling and transport via tunneling in epitaxial Fe/Si/Fe structures
linie570

R.R. Gareev, L.L. Pohlmann, D.E. Bürgler, and P.A. Grünberg
Institute "Electronic Properties"

We prepare epitaxial Fe(5 nm)/Si(0.8-2 nm)/Fe(5 nm) ferromagnetic tunneling junctions with strong anti ferromagnetic interlayer coupling. Transport properties in CPP geometry reveal (i) a strong increase of the resistance times area product with spacer thickness, (ii) parabolic dIldV-V characteristics, and (iii) a small and negative temperature coefficient of the zero-bias resistance. Therefore, anti ferromagnetic interlayer coupling and transport via tunneling coexists in these junctions.


 

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