IFF
Scientific Report 1999/2000


Institute of Electroceramic Materials

 

General Overview

 

Research Areas

The research areas of the institute comprise (1) technologies for the integration of electroceramic materials into microelectronics and microsystems, (2) dielectric and ferroelectric properties of oxide ceramics, and (3) the defect structure in the vicinity of internal and external interfaces in oxides. These areas are complementary to the research areas of the Institute for Electronic Materials 2 (IWE 2) at the Aachen Technical University (RWTH). Project groups often comprise staff members and students from both institutes.

 

Integration Technologies

In 1999, the major event in the area of the integration technologies has been the completion of the clean room and the installation of the equipment. An official opening celebration has been on September, 23th, 1999. The deposition of oxide thin films is performed by means of MOCVD (MOCVD = Metal Organic Chemical Vapor Deposition) systems. In cooperation with AIXTRON AG, a multiwafer planetary reactor has been installed for the development and optimization of (Ba,Sr)TiO3 films. In a first step, systematic parameter studies have been performed. Equipment for the electrical characterization of MOCVD processed BST films has been built and tested as part of an ESPRIT project (HECTOR 300). Our horizontal research MOCVD reactor has been tested by the deposition of SrTiO3, BaTiO3, and PbTiO3 thin films and it is now employed for new model systems, such as the (Ba,Pb)TiO3 solid solution which allows the materials tuning in a broad range of tetragonal ferroelectric distortions. Thin films made by CSD (Chemical Solution Deposition) at the IWE 2 in Aachen were prepared to provide high-precision compositional standards for the XRF analysis of the MOCVD films for both, the multiwafer planetory reactor and the horizontal reactor. In addition, alternative vaporizer systems have been tested. For the patterning of the ceramic films and electrode / ceramic film stacks, Reactive Ion Beam Etching (RIBE) and Reactive Ion Etching (RIE) techniques will be employed. In contrast to the situation in the standard Si and compound semiconductor technologies, dry etching processes of oxide ceramics have hardly been investigated as yet and, hence, represent a research area in which basic studies and industrially funded applied research can be linked in a beneficial manner. The RIBE system has been installed in the clean room is currently tested for a variety of reactive gases. The integration processes are complemented by metallization methods based on electron beam and sputter techniques. Within this area, our studies aim at a better understanding of the processes and material parameters which govern the adhesion, the mechanical stress, and the microstructure.

 

Dielectric and ferroelectric properties

The second research area focuses on the dielectric and ferroelectric properties of oxide thin films and bulk materials, which are being investigated in Jülich as well as in Aachen. The material systems are based on compositions used for practical devices and model systems, e.g. SrTiO3, BaTiO3, SrBi2Ta2O9, Pb(Zr,Ti)O3 and (Ba1-xPbx)TiO3. One of the research topics is the microscopic understanding of ferroelectric hysteresis including new approaches for the separation of reversible and irreversible contributions to polarisation based on the analysis of frequency-dependent small and large signals. These studies are linked to the aging (imprint) phenomenon, i.e. the polarisation-dependent shift of the hysteresis curve with time and to the ferroelectric fatigue process, i. e. the reduction of the remanent polarisation by cycling. Both aging and fatigue processes play an important role in the operation of the novel non-volatile memories (Ferroelectric Random Access Memories, FeRAM). Impedance spectroscopy in the lower GHz regime is employed to determine the relaxation of the ferroelectric domain wall motion and to separate this contribution from the contribution of the crystal lattice. By varying the microstructure of the ceramics and by comparison between bulk ceramics and thin films, the model of Arlt will be extended with respect to the impact on 2D constraints imposed by mechanical stress due to the presence of substrates. For dielectric ceramics, impedance spectroscopy is used to elucidate the interrelation of extrinsic losses and lattice defects. This activity includes the development and characterization of new microwave ceramics and is embedded into a cooperation with the Institute for Microstructural Research (Urban) and Norbert Klein’s group within the framework of a BMBF-Leitprojekt. In the case of ferroelectric materials, existing theories are further developed and extended towards a more quantitative description of the dielectric, piezoelectric, and elastic properties. Numerical finite-element-methods are used to describe the mutually coupled mechanical, thermal, and electrical properties of ceramic components such as multilayer capacitors and actuators.

Lattice disorder in the vicinity of internal interfaces

Our third research area comprises the lattice disorder in the vicinity of internal interfaces (grain boundaries) and external interfaces (surfaces and electrode interfaces) and their impact on electronic and ionic (oxygen ions and protons) charge transport. In the case of acceptor and donor doped titanate ceramics, the studies are focused on the formation of space charge depletion layers at grain boundaries as well as the related potential barriers and the transport of charge carriers along and across the grain boundary barrier. A hot-pressing technology has been developed to decorate the grain boundary area with additional dopants and to study the influence of these artifical grain boundary states. In some material systems, such as titanate-zirconate solid solutions, it is necessary to determine the equilibrium constants of the defect reactions and the diffusion constants of the system in order to create the basis for the research on interfaces. In this respect, the comparison of bulk ceramics and thin films of the same composition is of vital interest. In thin film systems, the significant influence of the electrode metals, the unexpectedly high stability under conditions of dc-voltage-induced resistance degradation, as well as the tolerance of the lattice concerning the incorporation of non-stoichiometries represent current research topics. Research on electronically conducting perovskites can be divided into studies on semiconducting and on metallically conducting oxides. In semiconducting, donor-doped SrTiO3, the emphasis is placed on the interrelationship between point defects and extended defects involved in oxidation and reduction processes using single crystals and ceramics. The metallically conducting manganates and cobaltates are investigated with respect to their magnetoresistive and ferromagnetic properties. By comparing epitaxial and polycrystalline thin films, the influence of the grain boundaries on charge transport and magnetic properties is studied. Artificial grain boundaries have been built and charge transport, including tunneling, across the barriers is investigated.

"Scaling effects in integrated electroceramic materials"- The HGF-proposal "PICCOLO"

The proposed HGF-Strategie-Fund Project "Piccolo" is embedded in the information technology program PGI (Physikalische Grundlagen der Informationstechnologie) of the Research Center Jülich. Beyond the Institut für Elektrokeramische Materialien (1), the (2) Institut für Mikrostrukturforschung IMF headed by K. Urban, (3) the Theorie III, headed by H. Müller-Krumbhaar, and (4) the Ion Technology (IT) group at the Institut für Schicht- und Ionentechnik headed by S. Mantl are involved. Several external international and international universities and research centers participate in "Piccolo", too. The main focus of the proposal "Piccolo" is a fundamental as well as applied research on scaling effects of electroceramic materials. Today, typically polycrystalline films exhibit grain sizes much smaller than the feature sizes of the microelectronic devices. However, along with the sustaining trend towards further miniaturization, the decreasing feature sizes in microelectronic technology will approach the typical crystallite sizes of the perovskite-type oxide structures. Specific scaling effects are anticipated along this route, due to the long-range nature of the ferroelectric interaction of the oxides involved. The project aims at an (1) elucidation of the physical origin of these scaling effects, (2) an exploitation and extension of the limits to which the ferroelectric properties and high permittivities of the oxides involved can be used, and (3) the development of technological design rules for the integration of the perovskite-type oxides on a decreasing scale. It will combine production-type process and research-type methods. The spectrum of designated results of the project comprises (semiquantitative) models for the superparaelectric limit of FE oxides, the dead layer at interfaces, the phase stability and segregation processes of perovskite films during annealing, the nucleation and growth of films by MOCVD, recipes for the deposition of single grain capacitors and ultrathin FE films as well as for reactive ion etching and a ferroelectric field-effect transistor (FE-FET) as a demonstrator. In summary the proposal "Piccolo" is an initiative to pursue resea5rch on the basic properties of electroceramic materials under scaling and the relevance of these effects for the integration of perovskite-type ferroelectric (FE) oxides into microelectronics.

 

Rainer Waser

 

 

 

Institute of Electroceramic Materials

Head: Prof. Dr.-Ing. Rainer Waser

Secretariat: Maria Garcia

Tel. (02461) 61 5811; Fax: (02461) 61 2550

e-mail: r. waser@fz-juelich.de/m.garcia@fz-juelich.de

Personnel 1999/2000 and areas of activity

SCIENTISTS:

Dr. R.R. Arons

Structure of magnetoresistive and ferroelectric oxides; charge transport in

proton conductors

23.42.0

Dr. H.G. Bohn

Mechanical and dielectric relaxation in solids. Impedance spectroscopy.

Defect chemistry. Electrochemical characterization of ceramic conductors

23.42.0

Dr. P. Ehrhart

MOCVD methods for electroceramical thin films; X-ray diffraction and

optical spectroscopy

23.42.0

Dr. S. Hoffmann

High-permittivity electroceramic thin films: MOCVD, dielectric properties,

charge transport, defect chemistry

23.42.0

Dr. H.H. Kohlstedt

Reactive ion beam etching of ceramic and metallic materials,

superconducting and magnetic multilayers

23.42.0

Dr. W. Krasser

Optical excitation-processes in electroceramic materials;light-annealing

processes

23.42.0

Dr. P. Meuffels

Processing of electroceramic materials; defect chemistry of electroceramic

materials

23.42.0

Dr. R. Otterstedt

Development of microwave ceramics; dielectric characterization;

extrinsic losses in microwave ceramics

23.42.0

Dr. Ch. Pithan

Processing of hot pressed nanocrystalline and grain boundary decorated bulk

electroceramics

23.42.0

Prof. T. Schober

High temperature proton conduction, thermogravimetry, impedance spectroscopy,

transmission electron microscopy

23.90.0

Dr. H. Schroeder

Technology and properties of (metal) electrodes for electroceramic thin films;

mechanical properties and electromigration in thin films and interconnects

23.42.0

Dr. K. Szot

Study of surface layer of perovskite materials of ABO3 structure

23.42.0

Prof. R. Waser

Electronic ceramics and integration of ceramic thin films

23.42.0

 

TECHNICAL ENGINEERS:

H. Bierfeld

Ceramic technology and sputtering techniques

23.42.0

U. Dedek

Electrical characterization of electronic ceramics; design of measuring setups

23.42.0

DI J. Friedrich

Thermogravimetric analysis; Transmission electron microscopy

23.42.0

DI H. Haselier

Metallization and thin film technology as well as clean-room technology

23.42.0

B. Hermanns

MOCVD, RIBE, sputtering of magnetic materials

23.42.0

DI H. John

Clean-room technology, microlithography and optical laboratory; LRP

23.42.0

R. Speen

Relaxation spectroscopy and electrochemical characterization

23.42.0

 

Ph.D. STUDENTS

O. Baldus (TH Aachen)

Laser annealing of CSD, MOCVD electroceramic thin films

23.42.0

F. Fitsilis (TH Aachen)

Thin film capacitors for future DRAM applications using the MOCVD technique

23.42.0

R. Ganster (TH Aachen)

Heterostructures of Titanate thin films, MOCVD growth and numerical

simulations

23.42.0

St. Regnery (TH Aachen)

MOCVD planetary reactor processes

23.42.0

J. Rickes (TH Aachen)

Reconfigurable multimedia processors based on ferroelectric RAM (FeRAM)

23.42.0

 

     

S. Ritter (TH Aachen)

MOCVD growth of ultrathin ferroelectric thin films and electrical

characterization

23.42.0

S. Schmitz, (TH Aachen)

Influence of the contact metal on leakage current and dielectric permittivity

of electroceramic thin film capacitors

23.42.0

R. Schmitz (Uni Köln)

Magnetic tunnel junctions, fabrication and experiments

23.42.0

St. Schneider (TH Aachen)

Reactive ion etching (RIE) and reactive ion beam etching (RIBE) of

ceramic thin films.

23.42.0

P. Schäfer (TH Aachen)

Evaluation of novel MOCVD systems for the deposition of ferroelectric thin films

23.42.0

 

GRADUANTS:

N. Giannas (TH Aachen)

Preparation of structured SrTiO3 thin films and characterization of the dielectric properties at microwave frequencies

23.42.0

J. Hövelmann (TH Aachen)

Computer control system for a laser annealing device

23.42.0

L. Kretschmar (TH Aachen)

Design of a pulse generator in the kilovolt regime using ahigh voltage cable to investigate the switching kinetics of ferroelectric thick films in the nanosecond regime

 

Ch. Ohly (TH Aachen)

Investigations of the high-temperature conductivity of doped titanate thin films

23.42.0

C. Reinartz (TH Aachen)

Characterization of electrodes for electroceramic thin films

23.42.0

S. Stein (Uni Köln)

Double barrier tunnel junctions with ferromagnets/superconductors

23.42.0

 

GUEST SCIENTISTS:

Dr. St. Hwang
Univ. of California (USA)

Polarization switching models in polycrystalline ceramics

23.42.0

Dr. W. Ma
Southeast Univ., Nanjing

(China)

Growth, microstructure and electrical property of ferro- electric thin films of perovskite-type oxides by MOCVD

23.42.0

Dr. N. Pertsev
A..F. Ioffe Institute

St. Petersburg (Russia)

Theoretical calculations on the effects of strain and stress on the dielectric response of ferroelectric thin films grown on the sole substrates

23.42.0